2001
DOI: 10.1016/s0040-6090(01)01227-5
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Structural characterization of TiCx films prepared by plasma based ion implantation

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Cited by 73 publications
(25 citation statements)
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“…Between these contributions C-Si bonds, at 282.5 eV, are expected. For nanocomposite Ti-C materials additional contributions have also been reported in this region [37,38,39,40,41,42,43,44], which have been associated with several different causes, including ion beam sputtering damage [42], and an interfacial state between nc-TiC and a-C phase [12,40,41,43]. Such contribution can hence not be excluded in the present samples, and is indicated in Figure 4 by TiC*.…”
Section: The Influence Of the Target-to-substrate Distance And Pressurementioning
confidence: 75%
“…Between these contributions C-Si bonds, at 282.5 eV, are expected. For nanocomposite Ti-C materials additional contributions have also been reported in this region [37,38,39,40,41,42,43,44], which have been associated with several different causes, including ion beam sputtering damage [42], and an interfacial state between nc-TiC and a-C phase [12,40,41,43]. Such contribution can hence not be excluded in the present samples, and is indicated in Figure 4 by TiC*.…”
Section: The Influence Of the Target-to-substrate Distance And Pressurementioning
confidence: 75%
“…In the figure, the peaks at 455.5 eV and 461.3 eV (red) can be attributed to Ti 2p 3/2 and 2p 1/2 of Ti-C bond, respectively [49]. The peaks at 458.8 and 464.6 eV (dark yellow) belong to the Ti in Ti-O bond (from TiO 2 ), which is always present on the TiC surface due to air oxidization [50]. The peaks at [50].…”
Section: Resultsmentioning
confidence: 96%
“…In the nanocomposite C 1s spectrum, an additional shoulder is observed at about ϳ283 eV binding energy between the C-C and Ti-C peaks, which we denote C-Ti ‫ء‬ . 3,7,[11][12][13][14][15][16] The intensity of this additional feature increases upon sputter etching. 17 However, recent studies with high-energy XPS have shown that it is present also in unsputtered samples.…”
Section: Introductionmentioning
confidence: 99%