2014
DOI: 10.7567/jjap.53.071002
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Structural and optical properties of boron-doped amorphous carbon nitride thin films synthesized by microwave electron cyclotron resonance-plasma chemical vapor deposition

Abstract: The structural and optical properties of boron (B)-doped amorphous carbon nitride (a-CNx) thin films with a B content of less than 10 at. % were investigated. The B-doped a-CNx thin films were synthesized by electron cyclotron resonance (ECR)-plasma chemical vapor deposition (CVD) by varying the substrate temperature and flow rate ratio of the source gases (BCl3/CH4/N2/Ar). An increase in the B content and a decrease in the Cl content were observed with increasing substrate temperature. The Tauc energy gap of … Show more

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Cited by 3 publications
(2 citation statements)
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“…The highest BE band position matches precisely with that of the sp 2 -hybridized CN bonds, for instance, as reported for CN and BCN layers. 32,47 This supports the previous attribution of the FTIR band at 1660 cm −1 . The observation of the CN bond (and its attribution to a separate double-bonded entity), however, does not so far exclude the possibility of carbon being chemically bonded to the GaN crystals, although no evidence for the latter was found from the FTIR.…”
Section: Resultssupporting
confidence: 91%
“…The highest BE band position matches precisely with that of the sp 2 -hybridized CN bonds, for instance, as reported for CN and BCN layers. 32,47 This supports the previous attribution of the FTIR band at 1660 cm −1 . The observation of the CN bond (and its attribution to a separate double-bonded entity), however, does not so far exclude the possibility of carbon being chemically bonded to the GaN crystals, although no evidence for the latter was found from the FTIR.…”
Section: Resultssupporting
confidence: 91%
“…The characteristic of HFCVD is that the catalytic role of the metallic substrate in decomposing the hydrocarbon precursors is taken over here by the heated filament that promotes the dissociation of gas carbon source and therefore the graphene films grown directly on glass at reduced temperatures could be achieved. Compared with PECVD and ECRCVD, HFCVD has some unique merits, including high deposition rate, easily handled substrate, and no damaging bombardment of energetic ions. , Although the decomposition ability problems can be resolved by either the filament in HFCVD or the plasma in PECVD and ECRCVD, it has been discovered that the films deposited on glass at reduced substrate temperatures by these methods still remain amorphous. …”
Section: Introductionmentioning
confidence: 99%