2015
DOI: 10.1002/sia.5846
|View full text |Cite
|
Sign up to set email alerts
|

Structural and nanomechanical properties of sol–gel prepared (K, Na)NbO3 thin films

Abstract: Perovskite (K, Na)NbO 3 (KNN) thin films (~100 nm) were prepared by sol-gel/spin coating process on Pt/SiO 2 /Si substrates and annealed at 650°C. The structural properties of KNN films were confirmed by X-ray diffraction analysis (XRD), Raman spectroscopy and scanning electron, transmission electron and atomic force microscopy (SEM, TEM and AFM) analysis. Pure perovskite phase of K 0.65 Na 0.35 NbO 3 in nonstoichiometric composition with monoclinic symmetry in film was revealed. Uniform homogeneous microstruc… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1
1
1

Citation Types

2
6
0

Year Published

2016
2016
2021
2021

Publication Types

Select...
7

Relationship

0
7

Authors

Journals

citations
Cited by 10 publications
(8 citation statements)
references
References 48 publications
2
6
0
Order By: Relevance
“…Fibroblast cells exhibit increased proliferation and spreading with increasing substrate stiffness in the range from 100 Pa to 100 kPa, but they also start to produce stress fibers above 10 kPa . Yet, fibroblast cells have been reported to proliferate well on glass substrates. , The bulk Young’s moduli of the materials used in the current study are reported to be in the range of 80–170 GPa, while for KNN films on SiPt, values between 70 and 100 GPa can be found . These values are much higher than the values typically used when studying the effect of substrate stiffness on cells and it is not clear from the literature whether the differences in such a high stiffness regime will influence cell behavior.…”
Section: Discussionmentioning
confidence: 57%
“…Fibroblast cells exhibit increased proliferation and spreading with increasing substrate stiffness in the range from 100 Pa to 100 kPa, but they also start to produce stress fibers above 10 kPa . Yet, fibroblast cells have been reported to proliferate well on glass substrates. , The bulk Young’s moduli of the materials used in the current study are reported to be in the range of 80–170 GPa, while for KNN films on SiPt, values between 70 and 100 GPa can be found . These values are much higher than the values typically used when studying the effect of substrate stiffness on cells and it is not clear from the literature whether the differences in such a high stiffness regime will influence cell behavior.…”
Section: Discussionmentioning
confidence: 57%
“…The addition of these dopants improved the polarization: the sample with 5% of Li presents a polarization of 16 μC cm −2 at 700 °C. Bruncková and co‐workers presented the deposition effect of K0. 65 Na 0.35 NbO 3 thin film in different substrates.…”
Section: Advanced Synthesis and Properties Of Knn And Related Composimentioning
confidence: 99%
“…As demonstration of its feasibility, modified sol-gel routes were recently used to prepare, at low temperature (<600 C) leadfree KNN thin films (%100 nm) with enhanced electrical and mechanical properties. [77,78] Another interesting example is represented by Kakimoto and co-workers [79] who synthesized porous Li 0.06 (Na 0.5 K 0.5 ) 0.94 NbO 3 (LNKN-6) and the composite LNKN-6/KNbO 3 using phenol resin fiber (Kynol TM ) as templating agent. Due to the low temperature required in the annealing step, the loss of alkali was completely suppressed in this synthesis.…”
Section: Novel Knn-based Systems Prepared Via Wet-chemistrymentioning
confidence: 99%
“…In only a few studies other solvents have been used, e.g. propionic acid 50 , ethanol 51 , water [52][53][54][55][56][57] and other 58,59 . Due to low cost and the ubiquity of Si in electronics, platinized silicon (SiPt, Pt/TiO2/SiO2/Si) is by far the most used substrate in ferroelectric oxide thin film CSD synthesis 17 .…”
Section: Introductionmentioning
confidence: 99%
“…Due to low cost and the ubiquity of Si in electronics, platinized silicon (SiPt, Pt/TiO2/SiO2/Si) is by far the most used substrate in ferroelectric oxide thin film CSD synthesis 17 . KNN thin film synthesis is no exception, and the majority of studies of KNN thin films are based on using SiPt substrates [19][20][21][22][23][24][28][29][30][31][32][33][34][35][36][40][41][42][43][46][47][48]52,53 , while a few other studies are reported using other substrates like SiO2/Si 38,58,59 , ZrO2/Si 44,45 , LaNiO3/Si 57 , Pt/MgO 39 , Pt/Al2O3 49,58 , metals 50,51,54 and SrTiO3 (STO) 18,[25][26][27]37,55,56 .…”
Section: Introductionmentioning
confidence: 99%