Structural and morphological characterization WCxNy thin films grown by pulsed vacuum arc discharge in an argon–nitrogen atmosphere

Ospina, Rogelio; Jurado, J. F.; Vélez, Juan Manuel; Arango, P.J.; Salazar-Enríquez, C.D.

doi:10.1016/j.surfcoat.2010.08.149

Cited by 10 publications

(6 citation statements)

References 51 publications

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“…Crystalline structure, microstructural, morphological and chemical characterisation 200) and ( 220) planes towards to lower diffraction angles are followed by a higher carbon concentration in the gas mixture during the deposition process. Titanium carbonitride structures are described in many works as a solid solution of TiC and TiN phases [12][13][14][15]. That is because the diffraction peaks of TiC, TiN and TiCN are near and, consequently, they are hard to be distinguished by XRD [8,14,16].…”

Section: Resultsmentioning

confidence: 99%

“…Titanium carbonitride structures are described in many works as a solid solution of TiC and TiN phases [12][13][14][15]. That is because the diffraction peaks of TiC, TiN and TiCN are near and, consequently, they are hard to be distinguished by XRD [8,14,16]. The quantification of crystalline phases that constitute this solid solution can be estimated by application of the Vegard's law [14,17].…”

Section: Resultsmentioning

confidence: 99%

“…That is because the diffraction peaks of TiC, TiN and TiCN are near and, consequently, they are hard to be distinguished by XRD [8,14,16]. The quantification of crystalline phases that constitute this solid solution can be estimated by application of the Vegard's law [14,17]. The lattice parameter and TiC x N y composition relationship is shown in Figure 2.…”

Section: Resultsmentioning

confidence: 99%

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Optical and tribological properties of decorative titanium carbonitride coatings

Milschi

Belahsen

Lain

et al. 2018

Surface Engineering

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Stainless steel and chromium-electroplated metal can change their metallic surface aspects into different colours by thin film deposition technologies. In this study, the colour change of titanium carbonitride (TiC x N y ) thin films as a function of N 2 and CH 4 flow rates in the deposition process was investigated. TiC x N y thin films were deposited by cathodic arc in an industrial equipment at low temperature (125°C) for decorative purposes. The samples were analysed by X-ray diffraction, scanning electron microscopy, glow discharge optical emissions spectroscopy, nanohardness, nanoscratch test and colorimetric analysis. The colour slightly changes from yellow gold to light bronze with carbon addition in the thin film structure. Scratch test determines an increase of the critical load for both plastic deformation and delamination as the carbon content increases. The failure mode shifts from brittle/ductile mode to ductile mode with the increase of the carbon content.

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Section: Resultsmentioning

confidence: 99%

Section: Resultsmentioning

confidence: 99%

Section: Resultsmentioning

confidence: 99%

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Optical and tribological properties of decorative titanium carbonitride coatings

Milschi

Belahsen

Lain

et al. 2018

Surface Engineering

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“…Nevertheless, another EDS analysis, previously reported in Ref. [44], shows the presence of small quantities (between 2 and 5%) of elements that are different from the substrate and belong not only to the target (W and C) but also to the gas (N) and surface contamination (O); furthermore, the XRD results for this case do not present strong evidence of an amorphous phase formation, which normally is displayed as shoulders in the diffractograms. The low density of coating possibly produces peaks of crystalline phases or amorphous components that exhibit lower intensities compared with those belonging to the substrate, making their identification difficult.…”

Section: Structure Analysismentioning

confidence: 50%

Plasma diagnostic and microstructural study of WCN coatings growth by pulsed vacuum arc discharge

Escobar

Ospina

Quintero

et al. 2018

Contributions to Plasma Physics

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In this work, we present a study of the plasma evolution during tungsten carbon nitride (WCN) coatings production using the repetitive pulsed arc technique. For the coatings production, a tungsten carbide (WC) target, and a mixture of argon and nitrogen as the filled gas were used. The study was carried out for discharges generated with one, two, three, and four pulses. The WCN coatings were characterized by X-ray diffraction (XRD) to identify the phases present in this material. The plasma was experimentally studied by optical emission spectroscopy (OES). A correlation was found between the spectral lines behavior and the material composition evolution. As the number of pulses increased, the intensity of the spectral lines also increased, especially in the case of the atomic lines of nitrogen, NI. The results were analysed to obtain information regarding the reactions in the plasma, as well as the electron temperature and density.

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“…They found that two different phases, a-WCN (hexagonal) and b-WCN (fcc), appeared depending on the different conditions. Recently, Ospina et al 20,25 prepared WCN with pulsed vacuum arc PVD using a WC target with nitrogen gas to study the phase evolution and analyse the chemical state of the WC x N y layers. They found that the phase transformation and the polycrystallinity depended on the number of pulses, N ¼ C ¼ N, C-C, C ¼ C, C-N and C ¼ N bonds existed in films and obtained a low hardness (lower than 15 GPa).…”

Section: Introductionmentioning

confidence: 99%

Structure and mechanical properties of reactive sputtered WCN films

Zhao

2016

Surface Engineering

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The WCN films with different C contents were deposited under different substrate bias by a sputtering system. The composition, structure and mechanical properties were characterised by X-ray photoelectron spectroscopy, X-ray diffraction, high resolution transmission electron microscopy, scanning electron microscopy, atomic force microscopy and nanoindentation. Results showed that the WCN films consisted of WCN, W 2 N, amorphous C and CNx phases. With the incorporation of C content, the growth pattern changed from continuous columnar to discontinuous columnar due to grain refinement. By applying substrate bias to the films, the growth pattern changed from discontinuous columnar to fine grained structure because the bias could enhance the mobility of impinging ions or atoms leading to film densification. As increasing the C content, the hardness first increased and then decreased due to the effect of solid solution strengthening and grain refinement. However, the substrate bias had little influence on the hardness because of the co-action of the dense structure and residual stress induced by bias.

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Structural and morphological characterization WCxNy thin films grown by pulsed vacuum arc discharge in an argon–nitrogen atmosphere

Cited by 10 publications

References 51 publications

Optical and tribological properties of decorative titanium carbonitride coatings

Optical and tribological properties of decorative titanium carbonitride coatings

Plasma diagnostic and microstructural study of WCN coatings growth by pulsed vacuum arc discharge

Structure and mechanical properties of reactive sputtered WCN films

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