2003
DOI: 10.1063/1.1604174
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Structural and morphological characteristics of planar (112̄0) a-plane gallium nitride grown by hydride vapor phase epitaxy

Abstract: Influence of the carrier gas composition on morphology, dislocations, and microscopic luminescence properties of selectively grown GaN by hydride vapor phase epitaxy

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Cited by 158 publications
(108 citation statements)
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“…8,11,63,64 on the other hand, found no appreciable QW thickness effect. 70 They proposed strain to be the dominant factor, and derived a large shear-strain deformation potential of D 6 =-8.8 eV from their measurements.…”
Section: 1467mentioning
confidence: 92%
See 1 more Smart Citation
“…8,11,63,64 on the other hand, found no appreciable QW thickness effect. 70 They proposed strain to be the dominant factor, and derived a large shear-strain deformation potential of D 6 =-8.8 eV from their measurements.…”
Section: 1467mentioning
confidence: 92%
“…For this reason, growth in nonpolar and semipolar orientations, which avoid the polarization fields, has been pursued to improve the device efficiencies. 8,9,56 In such nonpolar and semipolar In x Ga 1−x N layers, strain plays a crucial role in determining the polarization character of the emitted light. In this Section we explore the effects of strain on In x Ga 1−x N alloys in detail.…”
Section: Strain Effects In Ingan Alloysmentioning
confidence: 99%
“…28 The a-plane HVPE films were grown directly on sapphire in a three-zone horizontal reactor at 1040-1070°C. 29 Schematic drawings of the relative orientations of the anisotropically strained GaN films on their substrates are shown for c-plane GaN on a-plane sapphire in Fig. 1͑a͒ and a-plane GaN on r-plane sapphire in Fig.…”
Section: Methodsmentioning
confidence: 99%
“…In order to improve the structural quality of the samples, we processed the templates using the epitaxial lateral overgrowth (ELO) technique [5][6][7]. The reduction of the stacking fault density is then evidenced by the increase of near band edge PL emission intensity compared to that of the 3.42 eV band at T = 10 K [19,20].…”
Section: Methodsmentioning
confidence: 99%
“…Yet, the growth of nonpolar GaN layers is complicated because of adatom incorporation anisotropy between [0 0 0 1] and nonpolar axes [4]. Moreover, nonpolar GaN grown on foreign substrates exhibits high densities of extended defects such as stacking faults [5][6][7][8], and a broad defect-related emission line centered at 3.42 eV usually appears to the detriment of the near band-edge emission at 3.47 eV at low temperature (T < 10 K). Whereas this line is seldom observed in c-plane GaN [9][10][11][12][13], it is generally encountered in nonpolar GaN and has been attributed to the recombination of excitons bound to intrinsic I 1 -type basal plane stacking faults (BSFs) [14].…”
Section: Introductionmentioning
confidence: 99%