Abstract:TiAlN and TiAlN gradient films were deposited on Si substrates by reactive pulsed DC magnetron sputtering. The crystal structure and morphology of TiAlN films were characterized via X-ray diffraction (XRD), and field emission scanning electron microscope (FE-SEM), respectively. Moreover, elemental composition, hardness, and adhesion of TiAlN films were analyzed by energy-dispersive X-ray spectroscopy (EDS), nanoindentation test, and scratch test, respectively. The TiAlN films and TiAlN gradient films showed co… Show more
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