2018
DOI: 10.1007/s00339-018-2141-0
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Structural and magnetic properties of copper oxide films deposited by DC magnetron reactive sputtering

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Cited by 17 publications
(3 citation statements)
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“…The Cu 4 O 3 and Cu 2 O phases differ from each other in the stoichiometric ratio. The reduction of Cu 4 O 3 to Cu 2 O is governed by the endothermic reaction [13]: Thus, energy from a vacuum annealing is needed to convert the Cu 4 O 3 into Cu 2 O.…”
Section: Resultsmentioning
confidence: 99%
See 1 more Smart Citation
“…The Cu 4 O 3 and Cu 2 O phases differ from each other in the stoichiometric ratio. The reduction of Cu 4 O 3 to Cu 2 O is governed by the endothermic reaction [13]: Thus, energy from a vacuum annealing is needed to convert the Cu 4 O 3 into Cu 2 O.…”
Section: Resultsmentioning
confidence: 99%
“…The Cu 4 O 3 and Cu 2 O phases differ from each other in the stoichiometric ratio. The reduction of Cu 4 O 3 to Cu 2 O is governed by the endothermic reaction [13]:…”
Section: Structure and Chemical Compositionmentioning
confidence: 99%
“…TiN x layers can form an effective interdiffusion barrier [20,21,22,23]. Using air as reactive sputtering gas as is commonly done for Ni layers [24] could lead to ferromagnetic clusters caused by copper oxides [25]. We consequently investigated the effects of a pure nitrogen admixture on the microstructure of the Ti layers by using XRD on samples with a nominal thickness of 300 nm deposited on float glass.…”
Section: Effects Of Impurities On Single-and Multilayersmentioning
confidence: 99%