2016
DOI: 10.1109/tmag.2016.2528287
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Structural and Magnetic Properties of Sputter-Deposited Mn–Fe–Ga Thin Films

Abstract: We investigated structural and magnetic properties of sputter deposited Mn-Fe-Ga compounds. The crystallinity of the Mn-Fe-Ga thin films was confirmed using x-ray diffraction. X-ray reflection and atomic force microscopy measurements were utilized to investigate the surface properties, roughness, thickness and density of the deposited Mn-Fe-Ga. Depending on the stoichiometry, as well as the used substrates (SrTiO 3 (001) and MgO (001)) or buffer layer (TiN) the Mn-Fe-Ga crystallized in the cubic or the tetrago… Show more

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Cited by 11 publications
(11 citation statements)
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“…In addition, the magnetic properties have been shown to be tunable by atomic substitution [13]. Other examples of Mn-based tetragonal Heusler compounds with high PMA are Mn 3 Ge [14], Mn 3−x Co x Ga [15,16], and Mn 2 Fe x Ga [17,18]. A particular case to note is Mn 2 Ru x Ga, which has a moderate anisotropy energy (K eff ∼ 40 kJ m −3 ), but an extremely low magnetization leading to a very high anisotropy field and predicted resonance frequency [19][20][21][22][23][24].…”
Section: Introductionmentioning
confidence: 99%
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“…In addition, the magnetic properties have been shown to be tunable by atomic substitution [13]. Other examples of Mn-based tetragonal Heusler compounds with high PMA are Mn 3 Ge [14], Mn 3−x Co x Ga [15,16], and Mn 2 Fe x Ga [17,18]. A particular case to note is Mn 2 Ru x Ga, which has a moderate anisotropy energy (K eff ∼ 40 kJ m −3 ), but an extremely low magnetization leading to a very high anisotropy field and predicted resonance frequency [19][20][21][22][23][24].…”
Section: Introductionmentioning
confidence: 99%
“…This was attributed to the presence of two magnetic phases, possibly due to Mn-Fe atomic disorder. Recently, Niesen et al [18] deposited Mn-Fe-Ga thin films with various compositions in both cubic and tetragonal phases. They found maximal coercivity (1.8 T) for a Mn 3 Fe 0.4 Ga composition.…”
Section: Introductionmentioning
confidence: 99%
“…Considering that sputtering power can be calculated by formula (9), it can be expressed by formula (10).…”
Section: Methodsmentioning
confidence: 99%
“…Preparing thin films is crucial to developing microdevices. The thin-film physical, mechanical, and chemical properties depend on how the film structure is organized, which is closely related to film composition [8,9]. Single-metal-target and single-alloy-target sputtering are often used to fabricate various alloy thin films [10,11].…”
Section: Introductionmentioning
confidence: 99%
“…The so-called constructive chemical disorder, i.e., replacing Mn in Mn 3 Ga by 3d elements has been theoretically predicted to improve the spin polarization along the tetragonal c axis [38]. Thin films of Mn-Fe-Ga were recently reported to show high magnetocrystalline anisotropy; however, these films display high roughness [39]. Thin films of Mn 2 Fe x Ga grown on MgO substrates display a slight decrease of saturation magnetization M s with Fe concentration x, however, with nonfixed Ga concentration [40].…”
Section: Introductionmentioning
confidence: 99%