We successfully demonstrated epitaxial growth of semiconductor (BaSi 2 )/metal(CoSi 2 ) Schottky-barrier structures on Si(1 1 1), for the first time, by molecular beam epitaxy (MBE). The interface between the CoSi 2 and BaSi 2 layers was found to be sharp from transmission electron microscopy (TEM) observations. The current-voltage characteristics measured at room temperature showed clear rectifying properties. When positive bias was applied to the CoSi 2 layer with respect to the BaSi 2 layer, the current increased exponentially. Electron diffraction patterns obtained using reflection high-energy electron diffraction (RHEED) and TEM are discussed. r