2018
DOI: 10.1016/j.matlet.2017.11.101
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Structural and electrical properties of InN hollow nanotubes under high pressure

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Cited by 3 publications
(4 citation statements)
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“…Besides, the top-right inset in Figure a clearly reveals a much smaller contribution from the interior of the grain to the total resistance compared to that of grain boundary at high frequencies above 1.58 × 10 6 Hz. Similarly, it was found in InN hollow nanotubes under compression that the impedance arc of grain interior was covered by that of grain boundaries due to the small size effect and the high interface barrier in nanomaterials. The grain boundary effect was boosted compared to the grain effect and dominant in the total electrical transportation.…”
Section: Discussion and Resultsmentioning
confidence: 78%
“…Besides, the top-right inset in Figure a clearly reveals a much smaller contribution from the interior of the grain to the total resistance compared to that of grain boundary at high frequencies above 1.58 × 10 6 Hz. Similarly, it was found in InN hollow nanotubes under compression that the impedance arc of grain interior was covered by that of grain boundaries due to the small size effect and the high interface barrier in nanomaterials. The grain boundary effect was boosted compared to the grain effect and dominant in the total electrical transportation.…”
Section: Discussion and Resultsmentioning
confidence: 78%
“…frequencydependent complex impedance spectral analysis, is an effective in situ approach to study the bulk and grain boundary electrical transport properties of materials. Furthermore, it is often useful to interpret impedance spectra by the use of equivalent circuit simulation, by which the contributions of bulk and grain boundary effects can be clearly distinguished and accurately quantitative [21,22].…”
Section: Resultsmentioning
confidence: 99%
“…HP in situ impedance spectra of Fe-doped chrysotile NTs were measured with the parallel-plate-electrodes that were integrated on the two diamond anvils. The fabrication of electrodes on diamond surface, insulating method between gasket and Mo film electrode, and other experimental details were reported previously [21,22]. In the test, the powdered Fe-doped chrysotile NTs and a small piece of ruby as the pressure calibrant were loaded into a diamond-anvil cell.…”
Section: Methodsmentioning
confidence: 99%
“…The decrease in the carrier mobility of InN films is mainly due to grain boundary scattering and defect scattering. An appropriate InN buffer layer deposition temperature further improves the atom mobility of InN films, which indicates that an InN buffer layer can reduce defect density in subsequent InN films [35][36][37]. The Hall test results show that InN film grown on free-standing diamond substrate has the best carrier mobility when the InN buffer layer deposition temperature is 100 • C.…”
Section: Analysis Of Electrical Propertiesmentioning
confidence: 96%