Structural and Electrical Properties of SnO₂:F Thin Films Prepared by Chemical Vapor Deposition Method

Abstract

Fluorine doped tin oxide (FTO) thin films were deposited onto glass substrate at different substrate temperatures by a simple and inexpensive method of air pressure chemical vapor deposition. The substrate temperature was kept constant at about 500• C as the optimum temperature, and air was used as both a carrier gas and the oxidizing agent. A very simple method of characterization were carried on to investigate the electrical and structural properties of the prepared thin films. The electrical parameters variations showed that these parameters vary with substrate temperature ranging from an insulator thin film to a highly conductive layer. X-ray diffraction also revealed the structure to be polycrystalline at higher temperatures compared to amorphous structure for lower temperatures.

Study of fluorine-doped tin oxide thin films deposited by pneumatic spray pyrolysis and ultrasonic spray pyrolysis: a direct comparison

“…22 atoms, which is comparable to the findings reported by Martínez et al[49]. In their work, Martínez reported a carrier concentration of 7.33 × 10 20 cm −3 and a number of fluorine atoms of 6 × 10 20 atoms cm −3 .…”

“…In metal-semiconductor and metal-insulator-semiconductor structures, the metallic opaque layer can be substituted with an FTO layer [21]. FTO films can be deposited using various techniques, including sputtering, sol-gel process, spray pyrolysis, chemical vapor deposition (CVD), pulsed laser deposition (PLD), dip coating, inkjet printing, magnetron sputtering, and hydrothermal method [22][23][24][25][26][27]. Among these techniques, spray pyrolysis offers several advantages, making it an easily adoptable and cost-effective option for industry applications [3,7,9].…”

Recent advancements in modified SnO2–Sb electrodes for electrochemical treatment of wastewater

“…Beyond 500 °C, further changes occur in the SnO 2 crystals. 176 To achieve higher purity in SnO 2 –Sb and its modified materials, researchers combined additional methods with CVD. They employed plasma-enhanced chemical vapor deposition (PE-CVD) to improve the deposition rate and enhance the surface roughness of the coatings.…”

Optoelectronic Properties of Ti-doped SnO2 Thin Films Processed under Different Annealing Temperatures

“…Transparent conductive oxide (TCO) thin films possess excellent conductivity and optical transmittance in the visible and near-infrared regions, and are thus applied in many photoelectric components nowadays, including solar cells [1,2], organic light-emitting diodes [3,4], thin-film transistors [5,6], photovoltaic batteries [7][8][9], electrochromic devices [10][11][12], and tablet displays [13][14][15][16]. Metallic films are generally opaque in the visible light range.…”