2015
DOI: 10.1038/srep16652
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Structural and electrical properties of catalyst-free Si-doped InAs nanowires formed on Si(111)

Abstract: We report structural and electrical properties of catalyst-free Si-doped InAs nanowires (NWs) formed on Si(111) substrates. The average diameter of Si-doped InAs NWs was almost similar to that of undoped NWs with a slight increase in height. In the previous works, the shape and size of InAs NWs formed on metallic catalysts or patterned structures were significantly changed by introducing dopants. Even though the external shape and size of the Si-doped NWs in this work were not changed, crystal structures insid… Show more

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Cited by 18 publications
(11 citation statements)
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References 30 publications
(42 reference statements)
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“…This indicates that the InAs NWs for the NW4 sample are relatively uniform compared to the other NW samples. More details of the structural characteristics of InAs NWs depending on the growth parameters are shown in our previous report26. Figure 1(e) shows the THz current signals of the InAs NWs with respect to the time delay for the NW samples.…”
Section: Resultsmentioning
confidence: 87%
“…This indicates that the InAs NWs for the NW4 sample are relatively uniform compared to the other NW samples. More details of the structural characteristics of InAs NWs depending on the growth parameters are shown in our previous report26. Figure 1(e) shows the THz current signals of the InAs NWs with respect to the time delay for the NW samples.…”
Section: Resultsmentioning
confidence: 87%
“…3a ). These planar defects are commonly observed in the growth of InAs or InGaAs nanowires without foreign catalyst by MOCVD [ 26 28 ]. Figure 3b shows a bright-field (BF) low-resolution TEM image of a typical InGaAs/InP core−shell nanowire with Xv of 35% (as shown in Fig.…”
Section: Resultsmentioning
confidence: 99%
“…In most cases, Si is employed as an n-type dopant in InAs nanowires. [19][20][21][22][23] Using Si doping, densities in the order of 10 19 cm −3 are achieved. 20,21 However, apart from the increase of the carrier concentration in the nanowire, Si doping affects the growth kinetics as well as the nanowire dimensions.…”
Section: Introductionmentioning
confidence: 99%