Structural and chemical transformations in the products of the interaction of silica gel with vapours of TiCl4 and H2O

Koshtyal, Yury; Малков, А. А.; Taulemesse, Jean-Marie; Петров, С. Н.; Krasilin, Andrei A.; Малыгин, А. А.

doi:10.1016/j.apsusc.2013.10.077

Cited by 2 publications

(1 citation statement)

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“…The growth rates of H2O(500)+Al(100) and Po2(400)+Al(50) films are similar. For both samples, the maximum growth rate was observed at 250 °C and may have been caused by secondary processes [9,10] that lead to nanocrystal formation and/or formation lithium aluminate. The minimal values of growth rates (0.16-0.22 nm per cycle) were observed for the synthesis at 300 °C and are consistent with growth rates observed in the ALD process [4,5,8].…”

Section: Growth Per Cyclementioning

confidence: 96%

Atomic Layer Deposition of Li–Me–O Thin Films as Electrode Materials for Nanodevices Power Sources

et al. 2018

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The development of nanoscale power sources with a long battery life is now required for novel nanoelectronic devices, such as wireless sensors, biomedical implants, and smart cards. Lithiated metal oxides (Li–Me–O) are widely used in lithium-ion batteries (LIBs). Depending on the type of metal, Li–Me–O can be applied as cathode, anode, or electrolyte materials. Atomic layer deposition (ALD), due to its precision control over thickness, purity, and uniformity over large areas of applied coatings, can be applied for the synthesis of a different thin film LIBs materials. In the present work, the deposition of Li–Sn–O (anode) and Li–Al–O (electrolyte) by ALD is considered. The prepared films were investigated with the use of X-ray photoelectron spectroscopy and time-of-flight secondary ion mass spectrometry.

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Section: Growth Per Cyclementioning

confidence: 96%

Atomic Layer Deposition of Li–Me–O Thin Films as Electrode Materials for Nanodevices Power Sources

et al. 2018

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Electrochromic Properties of NiO Thin Coatings

Kondrateva

Bespalova

Baryshev

et al. 2019

KEM

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In this work, we report the role of structure on electrochromic behavior of nickel oxide thin coatings deposited via chemical vapor deposition on ITO-coated glass in (EtCp)2Ni–O2–Ar and (EtCp)2Ni–O3–O2–Ar reaction systems. The structure and chemical composition were analyzed and then correlated with electrochemical response and transmittance modulation when immersed in 1 M KOH electrolyte. The NiO exhibits an anodic coloration, reaching an optical density modulation of 0.66 between colored and bleached state at 550 nm, with a color efficiency of 30.7 cm2C-1. Very fast switching between states was obtained, the coloration and bleaching time did not exceed 0.05 sec.

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Structural and chemical transformations in the products of the interaction of silica gel with vapours of TiCl4 and H2O

Cited by 2 publications

References 29 publications

Atomic Layer Deposition of Li–Me–O Thin Films as Electrode Materials for Nanodevices Power Sources

Atomic Layer Deposition of Li–Me–O Thin Films as Electrode Materials for Nanodevices Power Sources

Electrochromic Properties of NiO Thin Coatings

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