We report a magneto-transport study of a two-dimensional hole gas confined to a strained Ge quantum well grown on a relaxed Si0.2Ge0.8 virtual substrate. The conductivity of the hole gas measured as a function of a perpendicular magnetic field exhibits a zero-field peak resulting from weak anti-localization. The peak develops and becomes stronger upon increasing the hole density by means of a top gate electrode. This behavior is consistent with a Rashba-type spin-orbit coupling whose strength is proportional to the perpendicular electric field, and hence to the carrier density. By fitting the weak anti-localization peak to a model including a dominant cubic spin-orbit coupling, we extract the characteristic transport time scales and a spin splitting energy of ∼1 meV. Finally, we observe a weak anti-localization peak also for magnetic fields parallel to the quantum well and attribute this finding to a combined effect of surface roughness, Zeeman splitting, and virtual occupation of higher-energy hole subbands.Hole spins in p-type SiGe-based heterostructures are promising candidates for quantum spintronic applications [1,2]. They are expected to display a relatively small in-plane effective mass [3,4], favoring lateral confinement, as well as long spin coherence times [5], stemming from a reduced hyperfine coupling (natural Ge is predominantly constituted of isotopes with zero nuclear spin and holes are less coupled to nuclear spins due to the p-wave symmetry of their Bloch states [6]). In addition, low-dimensional, SiGe-based structures benefit from a strong and electrically tunable spin orbit coupling [4,[7][8][9][10][11]. This property could be exploited for purely electrical spin control [5,[12][13][14]. Finally, hybrid superconductorsemiconductor devices based on strained Ge quantum wells confining holes should provide a favorable platform for the development of topologically protected qubits based on Majorana fermions of parafermions [15,16].Here we consider a SiGe-based heterostructure with a compressively strained Ge quantum quantum well (QW) at its surface. This heterostructure presents two main advantages: 1) in a metal-oxide-semiconductor field-effect transistor (MOSFET) device layout, it allows for an efficient gating of the accumulated two-dimensional hole gas (2DHG); 2) the surface position of the QW enables an easier fabrication of low-resistive contacts to the 2DHG. The strained SiGe heterostructure was grown on a 200 mm Si(001) substrate by means of reduced pressure chemical vapor deposition (RP-CVD). Growth was realized using an industrial-type, mass-production system (ASM Epsilon 2000 RP-CVD), which is a horizontal, cold-wall, single wafer, load-lock reactor with a lampheated graphite susceptor in a quartz tube. RP-CVD offers the major advantage of unprecedented wafer scalability and is nowadays routinely used by leading companies in the semiconductor industry to grow epitaxial layers on Si wafers of up to 300 mm diameter. The heterostructures, shown schematically in Fig. 1.a, consists of a 3 µm...