Stretchable Hydrophobic Surfaces and Self-Cleaning Applications

Yilbaş, Bekir Sami; Hassan, Ghassan; Al‐Qahtani, Hussain; Al-Aqeeli, N.; Al‐Sharafi, Abdullah; Almerbati, A.; Baroud, Turki N.; Adukwu, Johnny Adukwu

doi:10.1038/s41598-019-50982-8

Cited by 23 publications

(18 citation statements)

References 33 publications

(50 reference statements)

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“…When the sample was stretched 50% of its original size and then relaxed, the contact angle was found to be 132° ± 3°. The author stated that this experiment was repeated 12 times 42 . Similar to the bulk PI, the PI thin films produced in this study showed similar contact angle values even after 1000 repeated stretching and releasing cycles.…”

Section: Resultssupporting

confidence: 51%

“…The author stated that this experiment was repeated 12 times. 42 Similar to the bulk PI, the PI thin films produced in this study showed similar contact angle values even after 1000 repeated stretching and releasing cycles. Based on the mechanical durability results of PI thin film under repeated stretching and releasing cycle, PECVD PI thin films exhibited high durability without delamination.…”

Section: Film Structuressupporting

confidence: 57%

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Vapor deposition polymerization of synthetic rubber thin film in a plasma enhanced chemical vapor deposition reactor

Gürsoy

2020

J of Applied Polymer Sci

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Rubber is one of the most commonly used industrial materials worldwide. However, there is a gap in the literature on the production of rubber thin films in nanoscale. When the rubber thin films are produced in nanoscale, they can be used in high-tech applications where bulk rubbers have never been used before. This study is one of the first investigations to focus on the vapor-based production of the polyisoprene (PI), which is an important member of the synthetic rubber class. For this purpose, a single-step, rapid and environmentally friendly method based on plasma enhanced chemical vapor deposition (PECVD) was employed to produce PI thin films using 2-methyl-1,3-butadiene (isoprene). The high-vapor pressure of isoprene makes it a promising monomer for the production of chemical vapor deposition polymers. The effect of plasma processing parameters on the PI deposition rate was investigated. The deposition rate of PI thin film as high as 40 nm/min was achieved and the contact angle of PI coated bamboo surface was found to be 146.8. The mechanical durability and laundering tests of PI thin films were performed. Based on this study results, PI thin films produced by PECVD can be used in a number of potential applications.

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Section: Resultssupporting

confidence: 51%

Section: Film Structuressupporting

confidence: 57%

Vapor deposition polymerization of synthetic rubber thin film in a plasma enhanced chemical vapor deposition reactor

Gürsoy

2020

J of Applied Polymer Sci

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“…In addition, the dust particles compose of various elements and having different shapes and sizes. Some of the constituting compounds of dust do not yield stoichiometric elemental ratios while possessing ionic forces on dust surfaces, which is particularly the case for small dust particles (< 2.5 µm) 15 . Small particles tend to adhere to strong bonds on the surfaces.…”

mentioning

confidence: 99%

Avalanche effect for chemically modified dust mitigation from surfaces

Adukwu

Yilbaş

Jalilov

et al. 2021

Sci Rep

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Cost effective dust mitigation from surfaces is one of the challenges in various sectors. The reduction of dust adhesion on surfaces plays a vital role for dust mitigation from surfaces under the gravitational influence. Creating an avalanche effect on dusty surfaces improves the dust mitigation rate and provides an effective cleaning process. Hence, solution treatment of dust by low concentration hydrofluoric acid is considered towards reducing dust adhesion on glass surfaces. To increase the rate of dust mitigation, the avalanche influence is created by the higher density and larger size particles (5300 kg/m3 and ~ 50 µm) than the average size dust particles (2800 kg/m3 and 1.2 µm) via locating them in the top region of the dusty glass surfaces. Mitigation velocity of the dust particles is evaluated using a high-speed recording system and the tracker program. Findings revealed that solution treatment (curing) of the dust particles results in the formation of fluorine compounds, such as CaF2 and MgF2, on dust surfaces, which suppress dust adhesion on surfaces. OSHA Globally Harmonized System lists the fluorine compounds formed as environmentally non-harmful. Avalanche's influence results in dust mitigation at a smaller tilt angle of the glass surface (~ 52°) than that of the case with none-avalanche influence (63°). Area cleaned on the glass surface, via dust mitigation, is larger as the avalanche is introduced, which becomes more apparent for the solution treated dust particles. Dust mitigation under avalanche influence improves optical transmittance of the dusty glass samples by a factor of 98%.

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“…The hydrophobic wetting state of surfaces finds a wide range of applications in many fields including energy harvesting, 1 biomedical technology and medicine, 2 self-cleaning, 3 and similar.…”

Section: Introductionmentioning

confidence: 99%

Water Droplet Can Mitigate Dust from Hydrophobized Micro-Post Array Surfaces

Abubakar

Yilbas

Al‐Qahtani

et al. 2021

Preprint

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Water droplet rolling motion over the hydrophobized and optically transparent micro-post array surfaces is examined towards dust removal pertinent to self-cleaning applications. Micro-post arrays are replicated over the optically transparent polydimethylsiloxane (PDMS) surfaces. The influence of micro-post array spacing on droplet rolling dynamics is explored for clean and dusty surfaces. The droplet motions over clean and dusty micro-post array surfaces are monitored and quantified. Flow inside the rolling droplet is simulated adopting the experimental conditions. Findings reveal that micro-post gap spacing significantly influences droplet velocity on clean and dusty hydrophobized surfaces. Air trapped within the micro-post gaps acts like a cushion reducing the three-phase contact line and interfacial contact area of the rolling droplet. This gives rise to increased droplet velocity over the micro-post array surface. Droplet kinetic energy dissipation remains large for plain and micro-post arrays with small gap spacings. A Rolling droplet can pick up dust particles from micro-post array gaps; however, few dust residues are observed for large gap spacings. Nevertheless, dust residues are small in quantity over hydrophobized micro-post array surfaces.

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Stretchable Hydrophobic Surfaces and Self-Cleaning Applications

Cited by 23 publications

References 33 publications

Vapor deposition polymerization of synthetic rubber thin film in a plasma enhanced chemical vapor deposition reactor

Vapor deposition polymerization of synthetic rubber thin film in a plasma enhanced chemical vapor deposition reactor

Avalanche effect for chemically modified dust mitigation from surfaces

Water Droplet Can Mitigate Dust from Hydrophobized Micro-Post Array Surfaces

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