Stress control of sputter-deposited Mo–N films for micromechanical applications

Molybdenum Nitride Films: Crystal Structures, Synthesis, Mechanical, Electrical and Some Other Properties

“…In contrast, Kattelus et al [9] have reported compressive effective stresses in Mo-N films from 200 to 300 nm thick deposited by d.c. reactive sputtering for all compositions and structures of films from amorphous state (13%-17% N2) to crystalline phase (26% N2) (Section 4.1.1). However, the effective stress value for amorphous state can be tailored from compressive through zero into tensile by adding further argon gas into the deposition chamber.…”

“…Kattelus et al [9] have developed a deposition process, which allows the directional dependence in intrinsic film stress to be controlled for applications in micromachining. The films are deposited in (Ar-N2) gas mixture with an Ar partial pressure of 0.2 Pa using a dc sputtering system.…”

“…Kattelus et al [9], who observed a transition from amorphous to crystallized structures (Section 4.1.1), report a resistivity of 180 μΩcm for crystallized Mo2N films 200 nm thick.…”

“…Molydenum nitrides have also been synthesized in the form of amorphous structures such as Mo72N28 [31] and Mo75N25 [9] as well as compounds with N/Mo ratio larger than 1, such as the gold colored Mo3N2 phase [43].…”

“…They also have a good chemical resistance. Thus, they can be used in various applications such as hard coatings, corrosion and abrasion resistant layers to protect the tools (few microns thick), or as adaptive tribological coatings with low friction coefficient and wear [5][6][7][8] and for micromechanical applications [9]. They are also very interesting as gate electrodes and barriers of diffusion [10][11][12][13][14].…”