2022
DOI: 10.1016/j.colsurfa.2022.128925
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Strengthening the magnetic properties of Pr-Fe-B thin films using biased substrate

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Cited by 4 publications
(3 citation statements)
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“…Native oxides on the Si (100) substrate and oxygen impurities on the sputtering target both contributed to the establishment of the oxidation peak [26]. Another possible reason for the formation of oxides is the affinity and negative electric degree relationship between the elements [27]. The intensity of all oxide peaks dropped as the thickness of CoFeY increased.…”
Section: Methodsmentioning
confidence: 99%
“…Native oxides on the Si (100) substrate and oxygen impurities on the sputtering target both contributed to the establishment of the oxidation peak [26]. Another possible reason for the formation of oxides is the affinity and negative electric degree relationship between the elements [27]. The intensity of all oxide peaks dropped as the thickness of CoFeY increased.…”
Section: Methodsmentioning
confidence: 99%
“…Thus, the appearance of the oxidation peak can be ascribed to the metal's interaction with oxygen, resulting in partially oxidized Co 60 Fe 20 Sm 20 thin films [26]. The presence of oxides is deduced from the elemental affinities and interactions with oxygen [27]. Furthermore, the XRD analysis initially exhibited peaks at RT, indicating the crystalline nature of the material.…”
Section: Xrd Structure Propertymentioning
confidence: 99%
“…The emergence of oxidation peaks is ascribed to a combination of naturally occurring oxides present on the Si(100) substrate and oxygen contamination on the sputtering target[44]. The presence of oxides can be inferred from the affinities and negativities between each element and oxygen[45]. According to Figure1a-d, the total oxide peak intensities exhibited a distinct decrease with increasing CoFeBDy thickness and annealing temperature.…”
mentioning
confidence: 95%