2012
DOI: 10.1002/adfm.201200572
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Strained Interface Defects in Silicon Nanocrystals

Abstract: The surface of silicon nanocrystals embedded in an oxide matrix can contain numerous interface defects. These defects strongly affect the nanocrystals' photoluminescence effi ciency and optical absorption. Dangling-bond defects are nearly eliminated by H 2 passivation, thus decreasing absorption below the quantum-confi ned bandgap and enhancing PL effi ciency by an order of magnitude. However, there remain numerous other defects seen in absorption by photothermal defl ection spectroscopy; these defects cause n… Show more

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Cited by 66 publications
(52 citation statements)
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“…Earlier suggestions for such centers include Si=O double bonds, 30,31 Si-O-Si bridge bonds, 2,32-34 and strained bonds/geometries. 2,34,35 The former seem to be rather unstable. The latter, in view of the present results, may also be associated with inner regions of the NC.…”
Section: Resultsmentioning
confidence: 98%
“…Earlier suggestions for such centers include Si=O double bonds, 30,31 Si-O-Si bridge bonds, 2,32-34 and strained bonds/geometries. 2,34,35 The former seem to be rather unstable. The latter, in view of the present results, may also be associated with inner regions of the NC.…”
Section: Resultsmentioning
confidence: 98%
“…The PL decays exponentially, with the time constant slightly changes from 17 to 21 ns as the temperature is decreased from 300 to 77 K. This very short lifetime is in agreement with the electric-dipole allowed 4f–5d transition rate of Ce 3+ . Since non-radiative centers are frozen at low temperatures, we attribute the decrease of the PL intensity and the decay time to the energy transfer to defect centers by non-radiative recombination processes38.…”
Section: Resultsmentioning
confidence: 99%
“…In third generation silicon solar cells with a triple tandem structure, the top cell should have the highest band gap ($2.0 eV) and the two subsequent cells need to have sequentially lower band gaps in order to enable efficient absorption of the solar spectrum. 7 Among those, nanoscaled superlattice structures with alternate Si-rich layers and Si 3 N 4 /SiO 2 /SiC dielectric layers have attracted substantial attention as they provide superior control over the growth of Si-ncs 2 which, however, proceeds essentially through high temperature post-deposition annealing at $1100 C. [13][14][15][16] On annealing, solid-phase crystallization in the Si-rich layer leads to the formation of Si-ncs and their size-evolution is constrained by the thickness of the Si-rich sub-layer within the dielectric barriers on both sides. In implementing such a scheme, superior control over the size of the Si-ncs and their distribution are prerequisites.…”
Section: Introductionmentioning
confidence: 99%