2010
DOI: 10.1007/s10948-010-0741-9
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Strained InGaAs/GaAs Quantum-Well Laser Emitting at 1054 nm

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Cited by 4 publications
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“…It has an obstacle to realize 1053 nm, highly reliable single-mode operation due to the high mechanical strain in InGaAs QW layer on GaAs; a 6 nm thick strained buffer layer was grown to improve the surface quality [25,26]. The QW was grown at a temperature of 100 • C lower than the growth temperature of the cladding layers.…”
Section: Device Structure and Fabricationmentioning
confidence: 99%
“…It has an obstacle to realize 1053 nm, highly reliable single-mode operation due to the high mechanical strain in InGaAs QW layer on GaAs; a 6 nm thick strained buffer layer was grown to improve the surface quality [25,26]. The QW was grown at a temperature of 100 • C lower than the growth temperature of the cladding layers.…”
Section: Device Structure and Fabricationmentioning
confidence: 99%