2020
DOI: 10.1002/adma.202004995
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Strain‐Engineered Metal‐to‐Insulator Transition and Orbital Polarization in Nickelate Superlattices Integrated on Silicon

Abstract: X-Ant-Em instrument operated at 300 kV. The temperature dependent resistivities were measured with a van der Pauw geometry on a Quantum Design physical property measurement system. The XAS experiments were performed on the XTreme beamline at Swiss Light Source. [45]

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Cited by 27 publications
(22 citation statements)
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References 47 publications
(71 reference statements)
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“…The presence of Mn 2+ at the LMO/STO interface (Figure 2B) is due to electron accumulation driven by the polar discontinuity [28,29,38]. In contrast, no electronic reconstructions are observed at the LFO/STO interface because of the stable 3d 5 electronic configuration of Fe 3+ [39]. Instead, Nakamura et al showed that the polar charges were screened by an emergent spontaneous polarization at the LFO/STO heterointerface [40].…”
Section: Resultsmentioning
confidence: 98%
“…The presence of Mn 2+ at the LMO/STO interface (Figure 2B) is due to electron accumulation driven by the polar discontinuity [28,29,38]. In contrast, no electronic reconstructions are observed at the LFO/STO interface because of the stable 3d 5 electronic configuration of Fe 3+ [39]. Instead, Nakamura et al showed that the polar charges were screened by an emergent spontaneous polarization at the LFO/STO heterointerface [40].…”
Section: Resultsmentioning
confidence: 98%
“…6. The broad feature is caused by the in-plane mosaic spread of the SLs, which is generally present in oxide films grown on silicon 31,[35][36][37] . As n increases, the reflection shifts to smaller in-plane Q value, corresponding to an expanded in-plane lattice spacing.…”
Section: Resultsmentioning
confidence: 99%
“…This strain is caused by the difference in thermal expansion coefficients between silicon (~2.6 × 10 −6 K −1 ) and oxides (~8.7 × 10 −6 K −1 for STO and ~11.2 × 10 −6 K −1 for LMO) 31 , 35 . At the growth temperature, the SLs are fully relaxed from silicon and a is mostly determined by the relative thickness ratio among the constituent layers 37 . As the samples cool down to room temperature, a is constrained by the additional thermal tension from silicon 31 , 35 , 36 .…”
Section: Resultsmentioning
confidence: 99%
“…[4,37] Following this line of possible connection, the antiferromagnetic exchange interaction may be pivotal for the superconductivity in the NSNO thin films. Although the exact origin of the antiferromagnetism in superconducting NSNO thin films needs more studies, for example, our preliminary calculations that the surface of NSNO films could help stabilize the antiferromagnetic order (see Note S2, Supporting Information), or interface-induced electronic reconstruction [38][39][40][41] could occur at the interface between STO substrates [35,42] and NSNO thin films similar to the LaMnO 3 /STO [43,44] and LaAlO 3 /STO interfaces, [42,45,46] we believe that the experimental observation of the antiferromagnetic order superconducting NSNO thin films itself is fundamentally crucial so that this work may steer the center of focus for the rapidly developing field on the novel superconductivity in nickelates. In addition to the great interest in the community of condensed matter physics, the successful synthesis of this new type of Ni-based superconductors may pave the way to other important novel material applications such as energy, electromagnetic and spintronic materials and devices.…”
Section: Resultsmentioning
confidence: 99%