2017
DOI: 10.1021/acsami.6b13112
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Strain Effects in Epitaxial VO2 Thin Films on Columnar Buffer-Layer TiO2/Al2O3 Virtual Substrates

Abstract: Epitaxial VO/TiO thin film heterostructures were grown on (100) (m-cut) AlO substrates via pulsed laser deposition. We have demonstrated the ability to reduce the semiconductor-metal transition (SMT) temperature of VO to ∼44 °C while retaining a 4 order of magnitude SMT using the TiO buffer layer. A combination of electrical transport and X-ray diffraction reciprocal space mapping studies help examine the specific strain states of VO/TiO/AlO heterostructures as a function of TiO film growth temperatures. Atomi… Show more

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Cited by 50 publications
(37 citation statements)
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“…The differences to the TG results could be explained by a substrate mediated strain-effects for the silicon substrates, which is known to reduce the transition temperature as well as reducing the hysteresis, probably due to surface oxidation of the VO2 layer. [45,46] 14 The spectra displayed the typically two-peak structure (2 p3/2 and 2 p1/2) due to the spinorbit splitting. The binding energies decreased with lower oxidation state of the vanadium atom.…”
Section: Space Group P1 P1mentioning
confidence: 98%
“…The differences to the TG results could be explained by a substrate mediated strain-effects for the silicon substrates, which is known to reduce the transition temperature as well as reducing the hysteresis, probably due to surface oxidation of the VO2 layer. [45,46] 14 The spectra displayed the typically two-peak structure (2 p3/2 and 2 p1/2) due to the spinorbit splitting. The binding energies decreased with lower oxidation state of the vanadium atom.…”
Section: Space Group P1 P1mentioning
confidence: 98%
“…On the other hand, τ c of VO 2 has to be reduced for room temperature applications together with insufficient NIR regulating capability . Currently there are a few methods to address these two issues, i.e., chemical doping, nano‐thermochromism, nanoporous structure, core–shell structure, multilayered structure, and so forth. In this paper, we proposed a facile VO 2 /carbon composite structure synthesised by plasma enhanced chemical vapor deposition (PECVD).…”
Section: Introductionmentioning
confidence: 99%
“…Strain can be uniformly introduced in large, planar areas (cm 2 ) by epitaxial growth of thin VO 2 films on closely lattice matched substrates such as TiO 2 (001). Strain introduced in this manner has been demonstrated to reduce the transition temperature, and experimental evidence suggests that the structural component of the IMT can be suppressed . Epitaxially strained VO 2 films thus provide a unique platform for investigating the basic physical properties of the phase transition as well as a means for engineering the material response.…”
Section: Introductionmentioning
confidence: 89%
“…Film Growth : VO 2 films were grown via pulsed‐laser deposition (Lambda Physik, 248 nm, 20 ns pulse width) from a stoichiometric target (ACI Alloys) on single crystalline TiO 2 (001) and c‐cut Al 2 O 3 (0001) substrates with an oxygen partial pressure of 12 mTorr at substrate temperatures of 400 and 550 °C, with nominal thicknesses of 8 and 60 nm for the strained and relaxed films, respectively. The target to substrate distance was held constant at 5 cm and the films were deposited with a laser fluence of 2 J cm −2 with a repetition rate of 5 Hz.…”
Section: Methodsmentioning
confidence: 99%