2013
DOI: 10.1063/1.4842635
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Stimulated electroluminescence emission from n-ZnO/p-GaAs:Zn heterojunctions fabricated by electro-deposition

Abstract: In this study, n-ZnO thin films were electrochemically deposited on p-GaAs:Zn substrates. The XRD results of ZnO thin films deposited on p-GaAs:Zn substrates at potentials varied from −0.9 V to −1.2 V show a strong c-axis (002) orientation and homogeneity. The current-voltage characteristics exhibit rectification, proving a low turn-on voltage and an ideality factor of 4.71. The n-ZnO/p-GaAs heterostructures show blue-white electroluminescence (EL) emission, which is composed of broad emission bands. In additi… Show more

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Cited by 17 publications
(4 citation statements)
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“…These band offset values are very important in the fabrication of a proper heterojunction as it controls the variation of V OC and J SC . The band offset value for holes is found to be approximately eight times higher than the barrier for electrons [52]. According to this, the electron injection from n-AZO through i-ZnO into the p-CZTS is greater than the hole injection from p-CZTS into n-AZO through i-ZnO.…”
Section: Photovoltaic Properties Of Czts/azo Hetero-junctionmentioning
confidence: 78%
“…These band offset values are very important in the fabrication of a proper heterojunction as it controls the variation of V OC and J SC . The band offset value for holes is found to be approximately eight times higher than the barrier for electrons [52]. According to this, the electron injection from n-AZO through i-ZnO into the p-CZTS is greater than the hole injection from p-CZTS into n-AZO through i-ZnO.…”
Section: Photovoltaic Properties Of Czts/azo Hetero-junctionmentioning
confidence: 78%
“…Therefore, these results suggest that the crystal growth direction of zirconium oxide films depends on the Ar partial pressure. The grain size (D) of the ZrO 2 films was estimated by using Debye-Scherrer's Formula [29]…”
Section: X-ray Diffraction Studiesmentioning
confidence: 99%
“…Great efforts have been made to integrate epitaxial functional oxides with III-V semiconductor GaAs because of their widely promising applications (Liu et al, 2003;Ueda et al, 2006;Zheng et al, 2006;Wei et al, 2011;Köç et al, 2013;Galatage et al, 2014;Mazet et al, 2015;Lee, 2016;Kornblum et al, 2017;Zhou et al, 2017;Young et al, 2019;Verhulst et al, 2020;Zhou et al, 2020;Dalal et al, 2021). But there still exists some challenges for fabricating functional-oxide/GaAs heterostructures with excellent interfacial quality, such as the large lattice mismatch and interdiffusion of As and Ga atoms.…”
Section: Introductionmentioning
confidence: 99%