2015
DOI: 10.1134/s1070363215070154
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Stereoelectronic structure and self-association of N-trimethylsilylsulfonamides RSO2NHSiMe3 (R = Me, CF3, Ph)

Abstract: The effect of trimethylsilyl group Me 3 Si on the intramolecular electronic interactions and acid-base properties of N-trimethylsilylmethanesulfonamide, N-trimethylsilyltriflamide, and N-trimethylsilylbenzenesulfonamide was studied by the methods of quantum chemistry (DFT/ B3LYP/6-311+G**, NBO-analysis). Structural effects of the О-and N-protonation of these N-trimethylsilylsulfonamides and their isostructural carbon analogs were investigated.

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