Step and Repeat UV nanoimprint lithography tools and processes

McMackin, Ian; Choi, Jin; Schumaker, Philip; Quynh, Nguyen Van; Xu, Frank; Thompson, Ecron; Babbs, D.; Sreenivasan, S. V.; Watts, M.; Schumaker, N. E.

doi:10.1117/12.538733

Cited by 52 publications

(16 citation statements)

References 7 publications

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“…300 mm ø, where the resist is dispensed locally before each imprint step (SFIL, step and flash imprint lithography). Due to the inherently transparent stamps alignment and overlay issues have been investigated for UV-NIL explicitly 32 . This is supported by the fact, that an easy adaption of alignment methods of conventional photolithography is possible.…”

Section: Uv Nanoimprint (Uv-nil)mentioning

confidence: 99%

Nanoimprint lithography techniques: an introduction

Scheer

2006

22nd European Mask and Lithography Conference

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The main nanoimprint lithography techniques are highlighted in this paper. In addition to details concerning the materials used and the basic processing techniques, some of the major recent developments are summarized. Critical issues are addressed and some ideas for improvement are given. The paper aims to give an introduction to the techniques and a survey of the actual status without going into the details of the specific techniques.

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Section: Uv Nanoimprint (Uv-nil)mentioning

confidence: 99%

Nanoimprint lithography techniques: an introduction

Scheer

2006

22nd European Mask and Lithography Conference

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“…For some of those applications, alignment of the stamp to the substrate prior to the imprint is required. For UV-NIL technologies with small (<10 cm 2 ) rigid stamps, the alignment of multiple imprinted layers to each other was shown in many publications, 10,11 and an overlay accuracy of 16 nm was demonstrated. 11 But for soft lithography methods such as SCIL with large area PDMS stamps, results on overlay alignment with commercial tools can rarely be found.…”

Section: Introductionmentioning

confidence: 96%

Accuracy of wafer level alignment with substrate conformal imprint lithography

Fader

Rommel

Bauer

et al. 2013

Journal of Vacuum Science & Technology B, Nanotechnology an

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Substrate conformal imprint lithography (SCIL) is an innovative soft lithography method for the transfer of large area nanostructures. This technology was originally invented by Philips Research. With the implementation of the SCIL process on mask aligners, the standard alignment options of a mask aligner were also available for SCIL. This work presents studies on overlay alignment accuracy of the SCIL process on mask aligners. The utilized alignment markers were common box-in-box fiducials. With these structures, the alignment accuracy was determined. The experiments showed that the SCIL process induces a shift of the stamp with respect to the stage in imprint direction during the initial movement of the stamp from the SCIL actuator to the substrate. This shift is reproducible and depends on the distance between the actuator and the substrate. With an offset correction of the stage, this shift could be compensated. The achieved alignment accuracy was then below one micrometer, limited just by the mechanical capabilities of the mask aligner. Besides, global and local distortions of the imprinted structures with respect to the original master structures were identified and analyzed within this work. It was found that there is no systematic distortion of structures in the stamp due to the imprint process itself despite using the flexible composite SCIL stamps with polydimethylsiloxane pattern layer. Only nonsystematic local distortions could be found. Finally, the accuracy of the stamp manufacturing process for the SCIL stamps was investigated, and it was found that large distances in the centimeter range between single features are reproduced with a variation of 0.06‰. All together, the results of this work show that an accurate and reproducible overlay alignment of imprinted lithography layers is possible using SCIL as a wafer scale imprint technology

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“…Fundamental descriptions of this process and its potential capabilities can be found in many early publications. [4][5][6][7][8][9] Unless otherwise specified, the data and results included in this paper refer to J-FIL nanoimprint.…”

Section: Introductionmentioning

confidence: 99%

Technology review and assessment of nanoimprint lithography for semiconductor and patterned media manufacturing

Malloy¹

2011

J. Micro/Nanolith. MEMS MOEMS

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The semiconductor and hard disk drive industries are investigating nanoimprint for future high volume manufacturing of memory devices and patterned media. Nanoimprint, a form of 1× contact lithography, is one of the few technologies capable of meeting the resolution requirements for next generation electronic and storage devices. Its ability to produce small features with low line width roughness and critical dimension uniformity has been demonstrated by multiple sources. Significant improvements in defectivity have been shown; overlay has improved to within a factor of 2 of that required by the International Technology Roadmap for Semiconductors for 22 nm node flash memory devices; and next generation tools, templates, and processes are being commercialized and tested at end-user sites. Defectivity, throughput, and infrastructure remain as critical challenges, but each has experienced marked improvements in the past year. This technology review and assessment covers critical aspects of nanoimprint for both semiconductor and patterned media manufacturing. It focuses on jet and flash imprint lithography, the type of nanoimprint most often considered for these two applications. The requirements and current status of nanoimprint with respect to high volume manufacturing are presented, and critical aspects are discussed. C 2011 Society of PhotoOptical Instrumentation Engineers (SPIE).

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Step and Repeat UV nanoimprint lithography tools and processes

Cited by 52 publications

References 7 publications

Nanoimprint lithography techniques: an introduction

Nanoimprint lithography techniques: an introduction

Accuracy of wafer level alignment with substrate conformal imprint lithography

Technology review and assessment of nanoimprint lithography for semiconductor and patterned media manufacturing

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