Step and Repeat Ultraviolet Nanoimprinting under Pentafluoropropane Gas Ambient

Iyoshi, Shuso; Okada, Makoto; Katase, Tetsuya; Tone, Katsuhiko; Kobayashi, Kei; Kaneko, Shu; Haruyama, Yuichi; Nakagawa, Masaru; Hiroshima, Hiroshi; Matsui, Shinji

doi:10.7567/jjap.51.06fj08

Cited by 4 publications

(2 citation statements)

References 50 publications

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“…For this reason, UV-NIL in a specific gas atmosphere in which bubbles are dissolved in a UV-curable resin [e.g., helium (He)] or condensed rapidly (e.g., condensable gas) has been actively studied. [8][9][10][11][12][13][14][15][16] Helium gas is commonly used in dispensing-based UV-NIL techniques, so-called step-andflash UV-NIL and jet-and-flash UV-NIL, because it has some characteristics that are beneficial to high-speed nanoscale patterning processes, for example, the promotion of rapidly diffusing into the resin by replacing air. 8,9) However, helium also has negative attributes in UV-NIL, such as increasing the mold-releasing force.…”

Section: Introductionmentioning

confidence: 99%

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Bubble-free high-speed UV nanoimprint lithography using condensable gas with very low global warming potential

Suzuki

Youn

Hiroshima

2016

Jpn. J. Appl. Phys.

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Bubble-free filling needs to be achieved to realize high-throughput mass production in ultraviolet nanoimprint lithography (UV-NIL). Although bubble-free filling can be accomplished by performing UV-NIL under vacuum, nonvacuum processes can lower equipment and operation costs. UV-NIL in 1,1,1,3,3-pentafluoropropane (PFP) has been recognized as a promising method of realizing ultrahigh-speed UV-NIL; however, the global warming potential (GWP) of PFP of 1030 might restrict its industrial use. In this work, UV-NIL of a spin-coated UV-curable resin in trans-1-chloro-3,3,3-trifluoropropene (CTFP), which has a low GWP of <5, was studied with the aim of identifying an alternative to PFP. The cavity filling speed of resin and mold release force in CTFP were comparable to those in PFP, and superior to those in helium atmosphere. Sub-100 nm patterns were successfully fabricated by UV-NIL in CTFP, although the line width shrinkage ratio of patterns fabricated in CTFP was slightly larger than that of patterns fabricated in PFP.

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Section: Introductionmentioning

confidence: 99%

“…8,9) However, helium also has negative attributes in UV-NIL, such as increasing the mold-releasing force. 10) UV-NIL in condensable gas has been recognized as one of the most promising methods to realize ultrahigh-speed UV-NIL. 11) We have used 1,1,1,3,3-pentafluoropropane (PFP) in UV nanoimprinting based on gas condensation.…”

Section: Introductionmentioning

confidence: 99%

Bubble-free high-speed UV nanoimprint lithography using condensable gas with very low global warming potential

Suzuki

Youn

Hiroshima

2016

Jpn. J. Appl. Phys.

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Innovative UV nanoimprint lithography using a condensable alternative chlorofluorocarbon atmosphere

Matsui

Hiroshima

Hirai

et al. 2015

Microelectronic Engineering

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Bubble-free patterning with low line edge roughness by ultraviolet nanoimprinting using trans-1,3,3,3-tetrafluoropropene condensable gas

Suzuki

Youn

Hiroshima

2016

Applied Physics Letters

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Ultraviolet nanoimprint lithography (UV-NIL) in pentafluoropropane (PFP) is recognized as one of the most promising methods to achieve ultrahigh-speed UV-NIL without air bubble defects. Although liquefied PFP dissolved in the resin reduces the resin viscosity and demolding force, it also causes large shrinkage of the pattern and degrades the pattern quality compared with that achieved in air or He environments. In this work, UV-NIL in trans-1,3,3,3-tetrafluoropropene (TFP), which has a higher vapor pressure than that of PFP, was investigated with respect to throughput and pattern quality characteristics to find an alternative to PFP. Bubble-free filling of UV-NIL was demonstrated in an TFP atmosphere: the cavity-filling time was about four times shorter than that in He, and the fine values of line edge roughnesses comparable to those achieved in air or He were obtained.

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Step and Repeat Ultraviolet Nanoimprinting under Pentafluoropropane Gas Ambient

Cited by 4 publications

References 50 publications

Bubble-free high-speed UV nanoimprint lithography using condensable gas with very low global warming potential

Bubble-free high-speed UV nanoimprint lithography using condensable gas with very low global warming potential

Innovative UV nanoimprint lithography using a condensable alternative chlorofluorocarbon atmosphere

Bubble-free patterning with low line edge roughness by ultraviolet nanoimprinting using trans-1,3,3,3-tetrafluoropropene condensable gas

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