Stearic Acid as an Atomic Layer Deposition Inhibitor: Spectroscopic Insights from AFM-IR
Saumya Satyarthy,
Md Hasan Ul Iqbal,
Fairoz Abida
et al.
Abstract:Modern-day chip manufacturing requires precision in placing chip materials on complex and patterned structures. Area-selective atomic layer deposition (AS-ALD) is a self-aligned manufacturing technique with high precision and control, which offers cost effectiveness compared to the traditional patterning techniques. Self-assembled monolayers (SAMs) have been explored as an avenue for realizing AS-ALD, wherein surface-active sites are modified in a specific pattern via SAMs that are inert to metal deposition, e… Show more
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