2005
DOI: 10.1103/physreva.72.023404
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Steady-state light-induced forces for atom lithography

Abstract: The general properties of light-induced forces arising in dissipative light masks are considered. The localization sites of atoms depending on detuning and ellipticity are determined for an arbitrary configuration of monochromatic light beams resonant with two types of transitions: J J , where J is a half-integer, and J J + 1, where J is arbitrary.

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Cited by 2 publications
(5 citation statements)
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“…As is well known [18], one of the conditions for quasiclassical atomic translation motion is a smallness of recoil parameter, which is the ratio of photon momentum hk to atomic momentum dispersion △p:…”
Section: Statement Of the Problemmentioning
confidence: 99%
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“…As is well known [18], one of the conditions for quasiclassical atomic translation motion is a smallness of recoil parameter, which is the ratio of photon momentum hk to atomic momentum dispersion △p:…”
Section: Statement Of the Problemmentioning
confidence: 99%
“…When the condition ( 16) is satisfied,the atomic model under consideration is equivalent to the two-level ground state substates system. Really, in this case in the equation ( 4) the standard reduction procedure to the ground state [18] can be made. The obtained equation system for the ground-state density matrix can be compared with the wellknown equations for a two-level atom [19].…”
Section: Statement Of the Problemmentioning
confidence: 99%
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“…Let us recall several well-known examples. The resonant optical properties of an atomic medium with respect to a probe field are determined by the susceptibility tensor [8]. In the dipole approximation this tensor is expressed in terms of the multipole moments ρ K gg and/or ρ K ee of the ranks K ⩽ 2.…”
Section: Introductionmentioning
confidence: 99%