Steady-State and Time-Dependent LPP Modeling

White,; Dunne,; O'Sullivan,

doi:10.5772/8177

Cited by 1 publication

(1 citation statement)

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“…A deformable mirror not only helps to improve stability and reproducibility, more importantly, it is expected that a tophat MP spot will result in a higher EUV conversion efficiency than when using a Gaussian MP spot 8,9 . At TNO we have developed a high power adaptive mirror (HPAM) that allows to generate a top-hat MP spot in and around the beam waist position in the focal region.…”

Section: Introductionmentioning

confidence: 99%

Impact of design-parameters on the optical performance of a high-power adaptive mirror

Koek

Nijkerk

Smeltink

et al. 2017

High-Power Laser Materials Processing: Applications, Diagnostics, and Systems VI

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TNO is developing a High Power Adaptive Mirror (HPAM) to be used in the CO 2 laser beam path of an Extreme UltraViolet (EUV) light source for next-generation lithography. In this paper we report on a developed methodology, and the necessary simulation tools, to assess the performance and associated sensitivities of this deformable mirror. Our analyses show that, given the current limited insight concerning the process window of EUV generation, the HPAM module should have an actuator pitch of ≤ 4 mm.Furthermore we have modelled the sensitivity of performance with respect to dimpling and actuator noise. For example, for a deformable mirror with an actuator pitch of 4 mm, and if the associated performance impact is to be limited to smaller than 5%, the actuator noise should be smaller than 45 nm (rms). Our tools assist in the detailed design process by assessing the performance impact of various design choices, including for example those that affect the shape and spectral content of the influence function.

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Section: Introductionmentioning

confidence: 99%