2003
DOI: 10.1063/1.1622551
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Status and Prospects For VUV Ellipsometry (Applied to High K and Low K Materials)

Abstract: The recent commercialization of Vacuum Ultraviolet spectroscopic ellipsometry (VUV SE) instruments means that it is now possible to routinely perform SE measurements at wavelengths below 190 nm. This new capability has obvious implications for lithographic work but also for the characterization of other materials of importance to the Si industry. These are materials that are nominally transparent at long wavelengths but that possess unique absorption signatures in the VUV, such as newly emerging high-k gate ma… Show more

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Cited by 12 publications
(1 citation statement)
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“…On the one hand, both X-ray (XPS) and ultraviolet (UPS) photoemission spectroscopy (PES), and inverse photoemission (IPS) have been used to study the electronic structure. 10,11 On the other hand, X-ray or optical absorption, 12,13 spectroscopic ellipsometry (SE), [7][8][9][14][15][16] and electron energyloss spectroscopy (EELS) [17][18][19][20][21][22] have been used to study the optical and dielectric properties. By using linearization and extrapolation techniques over measured speca) Electronic mail: benoit.sklenard@cea.fr tra, these experiments extracted gap values ranging from 5.1 13 to 5.95 eV 16 .…”
mentioning
confidence: 99%
“…On the one hand, both X-ray (XPS) and ultraviolet (UPS) photoemission spectroscopy (PES), and inverse photoemission (IPS) have been used to study the electronic structure. 10,11 On the other hand, X-ray or optical absorption, 12,13 spectroscopic ellipsometry (SE), [7][8][9][14][15][16] and electron energyloss spectroscopy (EELS) [17][18][19][20][21][22] have been used to study the optical and dielectric properties. By using linearization and extrapolation techniques over measured speca) Electronic mail: benoit.sklenard@cea.fr tra, these experiments extracted gap values ranging from 5.1 13 to 5.95 eV 16 .…”
mentioning
confidence: 99%