State analysis of electrolytic chromate film by XPS and SXS

Mega, Tetsuya; Takao, Kenji; Shimomura, J.

doi:10.1016/s0169-4332(97)00269-9

Cited by 17 publications

(5 citation statements)

References 5 publications

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“…Special care in experimental conditions was taken to avoid the possibility of the reduction of trapped Cr(VI) by the X-ray beam. 70,73,74 By analogy to deposition obtained in the case of the reduction of Cr(VI) to Cr(III) on metallic surfaces, 75 we considered that the product that is formed is chromium trihydroxide Cr(OH) 3 .…”

Section: Resultsmentioning

confidence: 99%

“…We never detected any trace of Cr(VI) species (centered at 580.0 eV for K 2 CrO 4 , at 579.1 eV for CrO 3 and 580−581 eV for Phillips catalysts CrO x /SiO 2 , ), showing that the photochemical reaction does not trap unreduced species during the formation of the layer. Special care in experimental conditions was taken to avoid the possibility of the reduction of trapped Cr(VI) by the X-ray beam. ,, By analogy to deposition obtained in the case of the reduction of Cr(VI) to Cr(III) on metallic surfaces, we considered that the product that is formed is chromium trihydroxide Cr(OH) 3 .…”

Section: Resultsmentioning

confidence: 99%

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Patterning and Substrate Adhesion Efficiencies of Solid Films Photodeposited from the Liquid Phase

et al. 2010

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We experimentally and theoretically investigated the patterning and adhesion, always assumed and almost never discussed, of coatings photochemically deposited on substrates from photoactive solutions of different compositions and pHs. Considering the well-known deposition of Cr(III) layers from potassium chromate solutions, we analyzed the morphology and properties of the deposit when induced by two interfering continuous Ar + laser waves. The solubility, patterning, and adhesion are investigated in both organic (acetic acid) and inorganic (HCl) acidic solutions. The photodeposition process is also compared for several types of substrates usually found in the literature (glass, silanized glass, PMMA, silicon wafer, indium tin oxide (ITO), and stainless steel). We demonstrate the major role played by the interaction between the generated coating and the substrate and propose a strategy to find the best conditions for photochemical deposition from the liquid phase, an approach that is mandatory for any application requiring optical recording developments.

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Section: Resultsmentioning

confidence: 99%

Section: Resultsmentioning

confidence: 99%

Patterning and Substrate Adhesion Efficiencies of Solid Films Photodeposited from the Liquid Phase

et al. 2010

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“…and Cr 6? with Cr 2p 3/2 binding energies (BE) equal to 576.0 and 578.6 eV, respectively [32]. The BE observed in the 585-597 eV range correspond to Cr 2p 1/2 .…”

Section: Xps Investigationsmentioning

confidence: 99%

Methane Combustion Over Copper Chromites Catalysts Prepared by the Sol–Gel Process

et al. 2011

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Methane combustion was performed over a series of copper chromites (CuCr 2 O 4 ) catalysts prepared by the sol-gel process (SG). The results were compared with those obtained over commercial CuCr 2 O 4 . The samples were characterised by elemental analysis, thermal analysis, X-ray diffraction and X-ray photoelectron spectroscopy (XPS). The as-synthesised CuCr 2 O 4 sample exhibited higher specific surface area (248 m 2 g -1 ) with respect to commercial solids (42 m 2 g -1 ). The surface properties were established using XPS. Simultaneously, an increase in the atomic Cr 6? /Cr 3? ratio (0.56 for SG catalyst vs. 0.39 for commercial sample) and a decreasing surface copper concentration (8.3%, for SG specimen vs. 17.6% for commercial catalyst) are observed. XPS study revealed also that Cu 2? /(Cu°? Cu ? ) ratio of copper species remained constant (ca. 5) in both catalysts. Structure transformations of CuCr 2 O 4 under reduction-reoxidation conditions showed that the reduction of copper and/or chromium cations from the CuCr 2 O 4 and from delafossite (CuCrO 2 ) structure (CuCr 2 O 4 $CuCrO 2 ? Cu ? Cr 2 O 3 $Cu ? Cr 2 O 3 ) were different. This has lead to a difference in catalytic properties of the catalysts. Catalytic activity of SG catalysts was superior to that of commercial CuCr 2 O 4 tested under the same conditions. Complex hysteresis behaviour for CuCr 2 O 4 catalysts ramped over a temperature range of 220-850°C where the stables active phases were obtained only after the first ramp of heating under reactants. No catalysts deactivation was further observed after several cycles of heating and cooling. The stabilisation of catalytic activity was attributed to the formation of mixed crystalline phases containing both copper and chromium species.

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“…Figure 2 depicts the linear sweep voltammetry (LSV) curves for both chromate and HCl solutions at a potential range of 0.2 V to -0.8 V. At 1st cycle in the CrO 3 bath, two electrochemical reactions were observed for potentials between 0.2 V and -0.8 V. Considering the previous work of T. Mega et al, 35 as well as the Poubaix diagram of the Cr-water system, the observed current peak near 0.1 V seemed to be related to the electrolytic chromate process, described in Eq. 1.…”

Section: Resultsmentioning

confidence: 79%

Electrolytic Chromate Films Prepared via Pulse Electrodeposition as a Cu-Epoxy Adhesion Promoter

Kwon

Park

Lee

et al. 2020

J. Electrochem. Soc.

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Chromate films with nanometer-scale thicknesses typically act as secondary adhesive layers between Cu and a polymer film to produce a copper clad laminate (CCL); chromate films provide surface hydroxyl (-OH) that ensures strong binding with the silane coupling agent (primary adhesion promoter). To improve the adhesive strength between Cu and epoxy substrates, in this study, Cr(OH) 3 films with high surface coverages were deposited via the pulse electrodeposition technique. In comparison with conventional direct current modes, pulse plating enables the development of high densities of Cr(OH) 3 nuclei, resulting in a uniform film growth. Thus, the use of pulse plating leads to good coverage of Cr(OH) 3 on a Cu surface, and in turn, a higher peel strength with epoxy, and excellent corrosion protection. These observations indicate that chromate films generated via pulse plating may be a good option for post-treatment of Cu foils to ensure their reliable application for 5 G electronic devices.

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State analysis of electrolytic chromate film by XPS and SXS

Cited by 17 publications

References 5 publications

Patterning and Substrate Adhesion Efficiencies of Solid Films Photodeposited from the Liquid Phase

Patterning and Substrate Adhesion Efficiencies of Solid Films Photodeposited from the Liquid Phase

Methane Combustion Over Copper Chromites Catalysts Prepared by the Sol–Gel Process

Electrolytic Chromate Films Prepared via Pulse Electrodeposition as a Cu-Epoxy Adhesion Promoter

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