High stress stoichiometric silicon nitride resonators, whose quality factors exceed one million, have shown promise for applications in sensing and signal processing. Yet, electrical integration of the insulating silicon nitride resonators has been challenging, as depositing even a thin layer of metal degrades the quality factor significantly. In this work, we show that graphene used as a conductive coating for Si 3 N 4 membranes reduces the quality factor by less than 30 % on average, which is minimal when compared to the effect of conventional metallization layers such as chromium or aluminum. The electrical integration of Si 3 N 4 -Graphene (SiNG) heterostructure resonators is demonstrated with electrical readout and electro-static tuning of the frequency by up to 1 % per volt. These studies demonstrate the feasibility of hybrid graphene/nitride mechanical resonators in which the electrical properties of graphene are combined with the superior mechanical performance of silicon nitride.Resonators are essential components in modern electronics, and are often used as filters or oscillators. A key feature of a good resonator is a high quality factor, which conventional electronic filters have failed to meet. Nanoelectromechanical systems (NEMS) are of interest for sensing and signal processing applications because they can have the required high Q in addition to tunability and the potential for integration with silicon electronics 1,2,3,4 . Recently, stoichiometric silicon nitride resonators have been studied for their extremely high quality factor that can exceed one million, which originates from the high stress they possess 5,6,7 . However, the insulating nature of the material has hindered its broader implementation. Unfortunately, deposition of conventional metals as conducting layers degrades quality factor 8,9,10 -by more than a factor of four for only 5nm of chromium 8 , and even more severely for thicker layers 11 . Therefore, there is a strong motivation to identify conducting materials that do not impact the quality factor. In order for the dissipation to be dominated by the silicon nitride itself, the a) Sunwoo Lee, Vivekananda P. Adiga, and Robert A. Barton contributed equally to this work b)