Articles you may be interested inLow temperature annealed amorphous indium gallium zinc oxide (a-IGZO) as a pH sensitive layer for applications in field effect based sensors AIP Advances 5, 067123 (2015); 10.1063/1.4922440 Large area graphene ion sensitive field effect transistors with tantalum pentoxide sensing layers for pH measurement at the Nernstian limit Appl. Phys. Lett. 105, 083101 (2014); 10.1063/1.4894078 Hydrogen ion-selective electrolyte-gated organic field-effect transistor for pH sensing Appl. Phys. Lett. A pH sensor with a double-gate silicon nanowire field-effect transistor Appl. Phys. Lett. 102, 083701 (2013); 10.1063/1.4793655Densification of radio frequency sputtered silicon oxide films by rapid thermal annealing A detail investigation on the pH sensing performance of Gd 2 O 3 layer was proposed in this work. Electrolyte-insulator-semiconductor (EIS) structure with Gd 2 O 3 layer deposited directly on silicon by reactive radio frequency sputtering with Gd target was chosen as the testing platform. The postdeposition rapid thermal annealing (RTA), performed at various temperatures for 1 min in N 2 ambience, was first used to improve the pH sensing performance of Gd 2 O 3 . With RTA treatment at 800 C, pH sensitivity of Gd 2 O 3 EIS structure can be increased from 35.5 mV/pH to 55 mV/pH. This behavior can be explained by the increase of surface sites, which is supported by atomic force microscopy analysis. With RTA treatment at 700 C and 800 C, the drift coefficient for Gd 2 O 3 layer was reduced to 0.03 and 1.2 mV/h, which is resulted from the densification of Gd 2 O 3 layer supported by x-ray photoemission spectrometry. Therefore, Gd 2 O 3 layer with RTA in N 2 ambience at 700 C or 800 C could be a potential candidate for pH-sensitive membrane.