2014
DOI: 10.1016/j.polymdegradstab.2013.12.032
|View full text |Cite
|
Sign up to set email alerts
|

Stability of POSS crosslinks and aggregates in tetrafluoroethylene-propylene elastomers/OVPOSS composites exposed to hydrochloric acid solution

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
2
1

Citation Types

1
8
0

Year Published

2018
2018
2022
2022

Publication Types

Select...
6
1

Relationship

1
6

Authors

Journals

citations
Cited by 20 publications
(9 citation statements)
references
References 31 publications
1
8
0
Order By: Relevance
“…Pure OV‐POSS powder has characteristic crystalline peaks at 2Theta value of 9.4, 10.1, 22.8, and 23.7. The peak locations are significantly in line with the results of OV‐POSS spectra given in the literature 29 . As expected, NR/BR based amorphous polymer blend shows characteristic broad and lower intensity peaks when compared with OV‐POSS.…”
Section: Resultssupporting
confidence: 90%
“…Pure OV‐POSS powder has characteristic crystalline peaks at 2Theta value of 9.4, 10.1, 22.8, and 23.7. The peak locations are significantly in line with the results of OV‐POSS spectra given in the literature 29 . As expected, NR/BR based amorphous polymer blend shows characteristic broad and lower intensity peaks when compared with OV‐POSS.…”
Section: Resultssupporting
confidence: 90%
“…This situation usually appeared in the POSS-based polymers or composites with unbroken T 3 POSS units. 47,48 The Si 2p peaks located at intermediate BE values of 103.1 and 102.9 eV should be assigned to the emerging Si−OH groups coming from T 3derived T 2 , Q 2 , and Q 3 silicon units, which were also found in some reported POSS-based materials. 48,49 The appearance of Si−OH groups can be attributed to the destruction of POSS cages and cleavage of Si−C and Si−O bonds, 44,46,49 which is consistent with the analyses of 29 Si NMR (Figure 3B).…”
Section: ■ Results and Discussionmentioning
confidence: 83%
“…47,48 The Si 2p peaks located at intermediate BE values of 103.1 and 102.9 eV should be assigned to the emerging Si−OH groups coming from T 3derived T 2 , Q 2 , and Q 3 silicon units, which were also found in some reported POSS-based materials. 48,49 The appearance of Si−OH groups can be attributed to the destruction of POSS cages and cleavage of Si−C and Si−O bonds, 44,46,49 which is consistent with the analyses of 29 Si NMR (Figure 3B). Besides, the additional signals that appeared at higher values of 104.2 and 104.6 eV are assigned to the Si−O 2 structure within the new formed Q 4 units.…”
Section: ■ Results and Discussionmentioning
confidence: 83%
“…After adding OVAPOSS, its peak intensity at 18.51 and 20.09° decreased, showing that the addition of OVAPOSS could reduce the crystallinity of the membrane. Comparing the XRD patterns of the pure OVAPOSS reagent and the OVAPOSS membrane, it can be found that both the P 1 D 5 O 5% P 10% membrane and the P 1 D 5 O 7% P 10% membrane had obvious OVAPOSS peaks when 2θ = 9.8, 23.2, and 27.5° [ 23 ], which showed that OVAPOSS had been successfully doped into the membrane.…”
Section: Resultsmentioning
confidence: 99%