2018
DOI: 10.1016/j.diamond.2018.10.016
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Stability of hydrogenated amorphous carbon thin films for application in electronic devices

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Cited by 12 publications
(6 citation statements)
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References 43 publications
(86 reference statements)
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“…They can be used to increase hardness [ 1 , 2 , 3 ], improve wear resistance, reduce the coefficient of friction [ 1 , 2 , 3 , 4 , 5 ] and enhance the biocompatibility of the modified surface [ 6 , 7 ] or its resistance to colonisation by micro-organisms [ 7 , 8 ]. Due to their advantages, diamond-like carbon (DLC) coatings are tested in a wide range of applications in very different areas: biomedicine [ 5 , 6 , 7 , 8 , 9 ], machining [ 10 , 11 ], electronics [ 12 , 13 ] and electrochemistry [ 14 , 15 ]. To date, there are many known techniques for producing DLC coatings, with the dominant methods being chemical vapour deposition (CVD) and physical vapour deposition (PVD).…”
Section: Introductionmentioning
confidence: 99%
“…They can be used to increase hardness [ 1 , 2 , 3 ], improve wear resistance, reduce the coefficient of friction [ 1 , 2 , 3 , 4 , 5 ] and enhance the biocompatibility of the modified surface [ 6 , 7 ] or its resistance to colonisation by micro-organisms [ 7 , 8 ]. Due to their advantages, diamond-like carbon (DLC) coatings are tested in a wide range of applications in very different areas: biomedicine [ 5 , 6 , 7 , 8 , 9 ], machining [ 10 , 11 ], electronics [ 12 , 13 ] and electrochemistry [ 14 , 15 ]. To date, there are many known techniques for producing DLC coatings, with the dominant methods being chemical vapour deposition (CVD) and physical vapour deposition (PVD).…”
Section: Introductionmentioning
confidence: 99%
“…Por otro lado, cuando la presión de trabajo durante el depósito es mayor, las colisiones entre las partículas del material y las partículas del gas se incrementa, provocando que el número de colisiones en el trayecto sea mayor. Cuando la presión de trabajo es mayor la energía con la que las partículas colisionan contra el sustrato favorece un crecimiento preferencial de ciertos planos cristalinos en los materiales [8][9][10][11][12][13][14][15][16]. Por otro lado, la potencia de depósito está definida como la corriente (W) que se aplica en el cátodo para desprender el material.…”
Section: Introductionunclassified
“…Their electrical and electronic properties also change. The optical band gap and electrical resistivity are in the range of 0.5–4.5 eV [ 11 , 12 , 13 ], and 10 2 –10 16 Ω·cm [ 14 ], respectively. These films therefore have the potential to be used as semiconductor materials that offer widely variable optical and electrical properties.…”
Section: Introductionmentioning
confidence: 99%
“…Hydrogenated amorphous carbon began to attract attention as a semiconductor material after a -Si:H had already become the most commonly used amorphous semiconductor material [ 13 ]. As with a -Si:H, a -C:H can be synthesized over large areas and grown to have graded properties by controlling deposition conditions during the film growth.…”
Section: Introductionmentioning
confidence: 99%
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