Stability of 10B4C thin films under neutron radiation

Höglund, Carina; Zeitelhack, K.; Kudějová, P.; Jensen, Jens; Greczyński, Grzegorz; Lu, Jun; Hultman, Lars; Birch, Jens; Hall-Wilton, R.

doi:10.1016/j.radphyschem.2015.04.006

Cited by 63 publications

(58 citation statements)

References 28 publications

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“…10 B 4 C is the preferred material, instead of 10 B, 10 BN, or other 10 Bcontaining compounds, due to its relatively high boron content in combination with excellent wear resistance and thermal and chemical stability [14][15][16][17]. Additionally, the radiation hardness has recently been shown to be appropriate for these neutron detector applications [18]. Reference [12] addresses adhesion issues that often arise for micrometer-range-thick B 4 C films due to high residual film stresses in combination with low adhesive forces between the B 4 C film and the substrate.…”

Section: Introductionmentioning

confidence: 99%

Low-temperature growth of boron carbide coatings by direct current magnetron sputtering and high-power impulse magnetron sputtering

et al. 2016

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B 4 C coatings for 10 B-based neutron detector applications were deposited using high-power impulse magnetron sputtering (HiPIMS) and direct current magnetron sputtering (DCMS) processes. The coatings were deposited on Si(001) as well as on flat and macrostructured (grooved) Al blades in an industrial coating unit using B 4 C compound targets in Ar. The HiPIMS and DCMS processes were conducted at substrate temperatures of 100 and 400°C and the Ar pressure was varied between 300 and 800 mPa. Neutron detector-relevant coating characterization was performed and the coating properties were evaluated with regard to their growth rate, density, level of impurities, and residual coating stress. The coating properties are mainly influenced by general process parameters such as the Ar pressure and substrate temperature. The deposition mode shows only minor effects on the coating quality and no effects on the step coverage. At a substrate temperature of 100°C and an Ar pressure of 800 mPa, well-adhering and functional coatings were deposited in both deposition modes; the coatings showed a density of 2.2 g/cm 3 , a B/C ratio of *3.9, and the lowest compressive residual stresses of 180 MPa. The best coating quality was obtained in DCMS mode using an Ar pressure of 300 mPa and a substrate temperature of 400°C. Such process parameters yielded coatings with a slightly higher density of 2.3 g/cm 3 , a B/C ratio of *4, and the compressive residual stresses limited to 220 MPa.

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Section: Introductionmentioning

confidence: 99%

Low-temperature growth of boron carbide coatings by direct current magnetron sputtering and high-power impulse magnetron sputtering

et al. 2016

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“…The Multi-Grid detector is an Ar/CO 2 -filled proportional chamber, consists of the so-called 'grids': aluminium frames divided into 2.5 × 2.5 × 1 cm 3 cells by 0.5 mm thick aluminium 'blades', coated on both sides with enriched 10 B 4 C, 97% enriched in 10 B [36][37][38]. The coating thickness on the socalled 'short blades', perpendicular to the incident neutron beam, varies between 0.5-1.5 µm through the depth of the grid, to increase the efficiency.…”

Section: Geant4 Model Of Cspec Detector Modulementioning

confidence: 99%

Suppression of intrinsic neutron background in the Multi-Grid detector

et al. 2019

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One of the key requirements for neutron scattering instruments is the Signal-to-Background ratio (SBR). This is as well a design driving requirement for many instruments at the European Spallation Source (ESS), which aspires to be the brightest neutron source of the world. The SBR can be effectively improved with background reduction. The Multi-Grid, a large-area thermal neutron detector with a solid boron carbide converter, is a novel solution for chopper spectrometers. This detector will be installed for the three prospective chopper spectrometers at the ESS. As the Multi-Grid detector is a large area detector with a complex structure, its intrinsic background and its suppression via advanced shielding design should be investigated in its complexity, as it cannot be naively calculated. The intrinsic scattered neutron background and its effect on the SBR is determined via a detailed Monte Carlo simulation for the Multi-Grid detector module, designed for the CSPEC instrument at the ESS. The impact of the detector vessel and the neutron entrance window on scattering is determined, revealing the importance of an optimised internal detector shielding. The background-reducing capacity of common shielding geometries, like side-shielding and end-shielding is determined by using perfect absorber as shielding material, and common shielding materials, like B 4 C and Cd are also tested.On the basis of the comparison of the effectiveness of the different shielding topologies and materials, recommendations are given for a combined shielding of the Multi-Grid detector module, optimised for increased SBR.

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“…The ESS company was started 2010 in Lund, Sweden and it is a pan-European project involving participation of 17 European countries. ESS has been conducting research on building 10 B4C based solid-state neutron detectors and the estimated total coating area for the planned 10 B based-detectors covers 87 % of the total detector area of all instruments that will be built at ESS [12], [17], [18]. ESS will produce the first neutrons and bring the first instruments into operation in 2020.…”

Section: Neutron Detectorsmentioning

confidence: 99%

CVD Chemistry of Organoborons for Boron-Carbon Thin Film Depositions

Imam¹

2017

Linköping Studies in Science and Technology. Dissertations

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Stability of 10B4C thin films under neutron radiation

Cited by 63 publications

References 28 publications

Low-temperature growth of boron carbide coatings by direct current magnetron sputtering and high-power impulse magnetron sputtering

Low-temperature growth of boron carbide coatings by direct current magnetron sputtering and high-power impulse magnetron sputtering

Suppression of intrinsic neutron background in the Multi-Grid detector

CVD Chemistry of Organoborons for Boron-Carbon Thin Film Depositions

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