Sputtering Yields

Eckstein, W.

doi:10.1007/978-3-540-44502-9_3

Cited by 145 publications

(115 citation statements)

References 382 publications

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“…refs [23,24]) and often reasonable quantitative agreement is obtained. A less comprehensive comparison with experimental data exists on the angular distributions of sputtered atoms and the sputtering yield dependence on ion incidence angle [23,[25][26][27][28][29][30][31][32][33].…”

Section: Introductionmentioning

confidence: 57%

Simulation of ion beam sputtering with SDTrimSP, TRIDYN and SRIM

Hofsäß

Zhang

Mutzke

2014

Applied Surface Science

152

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A quantitative simulation of ion beam sputtering and related collision cascade effects is essential for applications of ion beam irradiation in thin film deposition, surface treatment and sculpting with focused ion beams, ion beam smoothing of surfaces and ion-induced nanopattern formation. The understanding of fundamental ion-solid interaction processes relevant for nanostructure formation, ion-induced mass redistribution, sputter yield amplification, ion beam mixing and dynamic compositional changes requires reliable simulations of ion-solid interaction processes in particular at low ion energies.In this contribution we discuss the possibilities, the key benefits and the limitations of three popular binary collision Monto Carlo simulation programs (SDTrimSP, TRIDYN and SRIM).The focus will be set to the calculation of angle dependent sputter yields, angular distribution of sputtered particles, sputter yields for compound materials, sputter yield amplification effects, as well as the extraction of parameters relevant for modelling ion-induced surface pattern formation from vacancy and recoil atom distributions.

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Section: Introductionmentioning

confidence: 57%

Simulation of ion beam sputtering with SDTrimSP, TRIDYN and SRIM

Hofsäß

Zhang

Mutzke

2014

Applied Surface Science

152

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“…2 shows that the time-averaged carbon removal rate of the a-C film is 0.7×10 at -300 V, i.e., it drops in this range by about a factor of 4 to 5 compared with pure a-C films. No tungsten atoms are removed at floating potential due to the low energy of ions, in this case only 11 eV (see section 2), which is below the threshold of physical sputtering of tungsten by oxygen (about 44 eV [27]). Between -50 and -300 V the C and W removal rates increase by a factor of 14 and 26, respectively.…”

Section: Resultsmentioning

confidence: 97%

Erosion of tungsten-doped amorphous carbon films in oxygen plasma

Wang

Jacob

Balden

et al. 2012

Journal of Nuclear Materials

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Abstract:Tungsten-doped amorphous carbon films with 0-9 at.% W concentration were produced by magnetron sputtering and eroded in oxygen plasmas applying different bias voltages and substrate temperatures. The partial C and W erosion rates were determined from the C and W areal density changes measured by Rutherford backscattering spectrometry (RBS). The initial C removal rate increases with increasing ion energy and temperature and decreases with increasing W concentration. For W-doped films the erosion rate decreases with increasing plasma exposure duration. At low bias voltages the erosion process stops after W accumulation at the surface, which protects the carbon underneath from further erosion. RBS and X-ray photoelectron spectroscopy suggest that the Wrich layer at the surface is carbon free and consists of porous WO 3 . Biasing to 200 V leads to removal of W by physical sputtering and, therefore, inhibits the formation of the protecting W oxide layer and the C erosion proceeds.

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“…As a consequence, this work uses sputtering yields obtained through simulations, which have the additional advantage of providing angular dependences. Eckstein [10] has provided yields with the help of the SDTrimSP code based on the binary collisional approximation (BCA), and the resulting fit formula in the form of…”

Section: Sputtering Yieldsmentioning

confidence: 99%

“…The minimum and maximum yields for D + and Be n+ on Be at normal incidence Y(E in ,0 o ) obtained this way are denoted by 'ERO-min' and 'ERO-max', respectively (see figure 6, left). The formula and parameters of Eckstein [10] have been used to provide the angular-dependent sputtering yields as illustrated in figure 6 (right).…”

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confidence: 99%

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ERO code benchmarking of ITER first wall beryllium erosion/re-deposition against LIM predictions

Borodin¹,

Kirschner²,

Carpentier-Chouchana³

et al. 2011

Phys. Scr.

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Previous studies (Carpentier et al 2011 J. Nucl. Mater. 415 S165-S169) carried out with the LIM code of the ITER first wall (FW) on beryllium (Be) erosion, re-deposition and tritium retention by co-deposition under steady-state burning plasma conditions have shown that, depending on input plasma parameter assumptions and sputtering yields, the erosion lifetime and fuel retention on some parts of the FW can be a serious concern. The importance of the issue is such that a benchmark of this previous work is sought and has been provided by the ERO code (Pitts et al 2011 J. Nucl. Mater. 415 S957-S964) simulations described in this paper. Provided that inputs to the codes are carefully matched, excellent agreement is found between the erosion/deposition profiles from both codes for a given ITER-shaped FW panel. Issues regarding the difficult problem of the correct treatment of Be sputtering are discussed in relation to the simulations. The possible influence of intrinsic Be impurity is investigated.

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Sputtering Yields

Cited by 145 publications

References 382 publications

Simulation of ion beam sputtering with SDTrimSP, TRIDYN and SRIM

Simulation of ion beam sputtering with SDTrimSP, TRIDYN and SRIM

Erosion of tungsten-doped amorphous carbon films in oxygen plasma

ERO code benchmarking of ITER first wall beryllium erosion/re-deposition against LIM predictions

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