Spray CVD of Single‐Source Precursors for Chalcopyrite I–III–VI2 Thin‐Film Materials

Hepp, Aloysius F.; Banger, Kulbinder K.; Jin, Michael H.‐C.; Harris, Jerry D.; McNatt, Jeremiah S.; Dickman, J.E.

doi:10.1002/9780470407790.ch6

Cited by 4 publications

(6 citation statements)

References 67 publications

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“…This approach was first reported in 1993 180. CIGS layers can be formed using the single‐source precursor by spray chemical vapour deposition (CVD) 181–183 and Figure 6 shows the SEM plane view and cross‐section images of spray CVD CuInS 2 deposited on Mo. Compared to spray pyrolysis deposited films, relatively large grains are observed in the plane view image and the cross‐section image shows columnar growth of CuInS 2 perpendicular to the substrate surface.…”

Section: Solution Processes For Cigs Depositionmentioning

confidence: 99%

“…While potentially cleaner than spray pyrolysis, secondary ion mass spectrometry (SIMS) analysis of spray CVD CuInS 2 films still indicates that small amounts of O, C and P (0·4, 0·04, and 0·03 at.%, respectively) exist in the final product. Recently, CuInS 2 devices with 1·0% efficiency ( J sc = 12·5 mA/cm 2 , V oc = 0·309 V and fill factor = 37%) have been reported for this method 182.…”

Section: Solution Processes For Cigs Depositionmentioning

confidence: 99%

See 1 more Smart Citation

Non‐vacuum methods for formation of Cu(In, Ga)(Se, S)₂ thin film photovoltaic absorbers

Hibberd

Chassaing

Liu³

et al. 2010

Progress in Photovoltaics

320

196

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Polycrystalline thin films of copper indium diselenide and its alloys with gallium and sulphur (CIGS) have proven to be suitable for use as absorbers in high-efficiency solar cells. Record efficiency devices of 20% power conversion efficiency have been produced by co-evaporation of the elements under high vacuum. However, non-vacuum methods for absorber deposition promise significantly lower capital expenditure and reduced materials costs, and have been used to produce devices with efficiencies of up to 14%. Such efficiencies are already high enough for commercial up-scaling to be considered and several companies are now trying to develop products based on non-vacuum deposited CIGS absorbers. This article will review the wide range of non-vacuum techniques that have been used to deposit CIGS thin films, highlighting the state of the art and efforts towards commercialization.

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Section: Solution Processes For Cigs Depositionmentioning

confidence: 99%

Section: Solution Processes For Cigs Depositionmentioning

confidence: 99%

Non‐vacuum methods for formation of Cu(In, Ga)(Se, S)₂ thin film photovoltaic absorbers

Hibberd

Chassaing

Liu³

et al. 2010

Progress in Photovoltaics

320

196

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show abstract

“…This method has been extensively reviewed, and when solvent evaporation occurs before contact with the surface, it can be referred to as spray chemical vapor deposition (CVD). 44 These spray growth methods are ideal for low-viscosity inks, which can be used to grow films that often do not require a subsequent high-temperature annealing step. However, controlled growth in this manner can require longer deposition times than a direct liquid coating approach.…”

Section: Coating Techniquesmentioning

confidence: 99%

Low-Cost Inorganic Solar Cells: From Ink To Printed Device

et al. 2010

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After attending Massey University in New Zealand as a Fulbright Scholar from 2002 to 2003, she returned to UC Berkeley to study the shape control and selective growth patterns of multimaterial heterostructures for catalytic and energy applications with Professor Yang, leading to a Ph.D. from the Department of Chemistry in 2008. Following a year of postdoctoral research on metal-semiconductor hybrid materials and the fate of nanomaterials in the environment with Dr. Taleb Mokari at the Lawrence Berkeley National Laboratory, she joined the National Renewable Energy Laboratory as a postdoctoral researcher. Her current research interests include the design of functional inks and development of solution deposition processes for photovoltaic materials.

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“…When complete evaporation of solvents is achieved before the droplets contact the surface (especially in the case of volatile precursors), this method is called Spray CVD (chemical vapor deposition). [66,67] While the possibility to avoid subsequent hightemperature anneal is advantageous in these spray-growth methods (notably distinguished from spray coating), they require precise process control and generally longer deposition times than sequential direct liquid coating approaches. In addition, residual aerosols and/or vapors account for lower materials utilization and require enhanced safety and environmental precautions.…”

Section: Non-vacuum Deposition Methodsmentioning

confidence: 99%

“…Spray pyrolysis and Spray-CVD have been used for the deposition of CuInS 2 [65][66][67] as well as oxides that were later treated in chalcogen vapor to form CuInSe 2 . [68,69] Power conversion efficiencies of up to 5 % have been reported using this approach.…”

Section: Non-vacuum Deposition Methodsmentioning

confidence: 99%

Direct Liquid Coating of Chalcopyrite Light‐Absorbing Layers for Photovoltaic Devices

Todorov¹,

Mitzi²

2009

Eur J Inorg Chem

221

160

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Liquid deposition approaches for chalcopyrite films used in thin-film photovoltaic devices are reviewed. Most of the targeted materials are based on Cu-In or Cu-In-Ga sulfides and selenides (i.e., CIS or CIGS, respectively), although recently related alternative materials based on abundant and nontoxic elements such as the kesterite Cu 2 ZnSnS 4 have been actively investigated. By direct liquid coating we refer collectively to a variety of techniques characterized by distributing a liquid or a paste to the surface of a substrate, followed by necessary thermal/chemical treatments to achieve the desired phase. The deposition media used are solutions or particle (usually submicrometer size) suspensions of metal oxide, organic and inorganic compounds, including metal chalcogenide species. The deposition techniques used are mainly printing and spin-coating, although any standard process such as

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Spray CVD of Single‐Source Precursors for Chalcopyrite I–III–VI2 Thin‐Film Materials

Cited by 4 publications

References 67 publications

Non‐vacuum methods for formation of Cu(In, Ga)(Se, S)₂ thin film photovoltaic absorbers

Non‐vacuum methods for formation of Cu(In, Ga)(Se, S)₂ thin film photovoltaic absorbers

Low-Cost Inorganic Solar Cells: From Ink To Printed Device

Direct Liquid Coating of Chalcopyrite Light‐Absorbing Layers for Photovoltaic Devices

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Spray CVD of Single‐Source Precursors for Chalcopyrite I–III–VI2 Thin‐Film Materials

Cited by 4 publications

References 67 publications

Non‐vacuum methods for formation of Cu(In, Ga)(Se, S)2 thin film photovoltaic absorbers

Non‐vacuum methods for formation of Cu(In, Ga)(Se, S)2 thin film photovoltaic absorbers

Low-Cost Inorganic Solar Cells: From Ink To Printed Device

Direct Liquid Coating of Chalcopyrite Light‐Absorbing Layers for Photovoltaic Devices

Contact Info

Product

Resources

About

Non‐vacuum methods for formation of Cu(In, Ga)(Se, S)₂ thin film photovoltaic absorbers

Non‐vacuum methods for formation of Cu(In, Ga)(Se, S)₂ thin film photovoltaic absorbers