TENCON 2005 - 2005 IEEE Region 10 Conference 2005
DOI: 10.1109/tencon.2005.300923
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Spral Inductor Coupling on 0.25 ¿m Epitaxial CMOS Process

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Cited by 2 publications
(6 citation statements)
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“…In the same way, the use of halo substrate contacts as compared to using plain spiral inductors, also results in a decrease in the resonant frequency. This is consistent with the findings of [11], which attributes the increase in extracted shunt capacitance to fringing effects when using halo substrate contacts.…”
Section: Spiral Inductorssupporting
confidence: 92%
“…In the same way, the use of halo substrate contacts as compared to using plain spiral inductors, also results in a decrease in the resonant frequency. This is consistent with the findings of [11], which attributes the increase in extracted shunt capacitance to fringing effects when using halo substrate contacts.…”
Section: Spiral Inductorssupporting
confidence: 92%
“…In the same way, the use of halo substrate contacts as compared to using plain spiral inductors, also results in a decrease in the resonant frequency. This is consistent with the findings of [11], which attributes the increase in extracted shunt capacitance to fringing effects when halo substrate contacts are used.…”
Section: A Effects Of Inductor Structuresupporting
confidence: 91%
“…It is also interesting to note that the effect of PGS on the amount of isolation, as shown in Table 1, is consistent with the results in [11], which states that using inductors with PGS improves isolation. The same study also inferred from its measured results that the use of inductors with halo substrate contacts do not improve isolation.…”
Section: A Effects Of Inductor Structuresupporting
confidence: 86%
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