Spot scanning imaging calibration method based on deviation model for wafer inspection
Dingjun Qu,
Zuoda Zhou,
Zhiwei Li
et al.
Abstract:The spot scanning defect detection system has good detection performance for wafer defects. However, due to the existence of system assembly errors, the wafer defect inspection system could not scan following the planned trace, which resulted in distortion of the reconstructed image and had a greater impact on defect feature extraction and accurate defect location. The system deviation calibration and adjustment can further facilitate the accuracy of the system position and image reconstruction. To address thi… Show more
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