2005
DOI: 10.1063/1.2135385
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Spontaneous formation of nanometric multilayers of metal-carbon films by up-hill diffusion during growth

Abstract: We report the spontaneous formation of multilayer structures with nanometric periodicity during Ti–C thin-film growth by reactive magnetron sputtering. Their characterization was performed by transmission electron microscopy, x-ray photoelectron spectroscopy, x-ray diffraction, and secondary ion mass spectrometry. We discuss film structure and morphology as a function of metal content, and propose surface-directed spinodal decomposition as the mechanism responsible for the segregation of species in separated l… Show more

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Cited by 29 publications
(35 citation statements)
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“…These expectations are supported by previously reported vertical composition modulations during perpendicular iPVD or ion assisted growth of carbontransition metals, [24][25][26]33 Au-SiO 2 48 or Au-Ni. 27 Moreover, changing the tilting or in-plane angle during growth provides the potential to sculpt the patterns into complex structures such as chevrons and helices.…”
Section: Discussionsupporting
confidence: 85%
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“…These expectations are supported by previously reported vertical composition modulations during perpendicular iPVD or ion assisted growth of carbontransition metals, [24][25][26]33 Au-SiO 2 48 or Au-Ni. 27 Moreover, changing the tilting or in-plane angle during growth provides the potential to sculpt the patterns into complex structures such as chevrons and helices.…”
Section: Discussionsupporting
confidence: 85%
“…28,29 Thermodynamic forces lead to a precipitation of metal carbide or pure metal phase in the carbon matrix. [24][25][26]33,43,44 Carbon ions continue to be deposited onto the carbon matrix or onto the clusters themselves. Eventually excess carbon segregates to surfaces of and spaces between the clusters, encapsulating the metal and forming a continuous carbon layer.…”
Section: -4mentioning
confidence: 99%
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“…The use of pulses has also beneficial effects when growing DLC and metal-containing DLC films by pulsed-dc reactive magnetron sputtering. 26,27 Used in parallel with film deposition, plasma diagnostics ensure process control and reproducibility of the process. Optical emission spectroscopy ͑OES͒, 28,29 quadrupole mass spectrometry ͑QMS͒, 30,31 and diagnostics by means of a retarding field energy analyzer ͑RFEA͒ 32 and a Langmuir probe [33][34][35] are the most common plasma characterization techniques.…”
Section: Introductionmentioning
confidence: 99%
“…[3][4][5][6][7] Despite the experimental accomplishments, understanding of the physical mechanism and the driving force is still rather limited, partially due to the fact that a high spatial resolution examination of the structures were not performed. Self-assembling is often associated with surface irradiation, 2,6,7 high temperature, 7 metal species and content, 5,7 deposition rate, 4 etc.…”
mentioning
confidence: 99%