Spin‐Coatable Inorganic Resists Based on Novel Peroxopolyniobotungstic Acids for Bilayer Lithography

Kudo, Tetsuichi; Ishikawa, Akira; Okamoto, Hiroshi; Miyauchi, Katsuki; Murai, F.; Mochiji, Kōzō; Umezaki, H.

doi:10.1149/1.2100252

Cited by 31 publications

(7 citation statements)

References 6 publications

(9 reference statements)

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“…Early transition metal polyoxoanions have long been known to have an extensive surface chemistry that plays a key role in such traditional areas as catalysis, corrosion protection, and electrochemistry, as well as newer areas such as metal colloid stabilization, electroless deposition, bilayer lithography, and fine metallic patterning . The precise role played by polyoxoanions at solid−gas, solid−solid, and solid−liquid interfaces in these systems has been difficult to establish, however, in the absence of structural information on the atomic molecular size scale.…”

Section: Introductionmentioning

confidence: 99%

Polyoxoanion Chemistry Moves toward the Future: From Solids and Solutions to Surfaces

1998

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Klemperer received a B.A. in Chemistry from Harvard College in 1968 and a Ph.D. in Inorganic Chemistry under the supervision of Professor F. A. Cotton from MIT in 1973. After eight years at Columbia University, he joined the faculty at the University of Illinois at UrbanasChampaign where he is currently Professor of Chemistry. His research interests include dynamic stereochemistry, polyoxoanion chemistry, metal alkoxide chemistry, and inorganic materials chemistry, including zeolite, cement, and sol−gel chemistry. Craig G. Wall was born in Texas in 1967. He received his B.S. in chemistry from the University of Texas at Austin in 1990 and a Ph.D. in 1995 from the University of North Carolina where he studied electrontransfer reactions in synthetic peptides under the direction of Professors Bruce W. Erickson and Thomas J. Meyer. He is currently a postdoctoral fellow at the University of Illinois with Professor Walter G. Klemperper where he using scanning tunneling microscopy to investigate selfassembled inorganic monolayers.

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Section: Introductionmentioning

confidence: 99%

Polyoxoanion Chemistry Moves toward the Future: From Solids and Solutions to Surfaces

1998

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“…As the h‐WO 3 as well as the monoclinic phase (I) has attracted a lot of attention as an alternative material for photocatalyst, a facile and inexpensive preparation method of h‐WO 3 is highly desirable. Our research group has been investigating a soft‐chemical synthesis of metal oxides starting from a peroxo‐metallic acid solution obtained by the direct reaction between metal powder and hydrogen peroxide . Using such new methods we have successfully prepared K x WO 3 , BaTiO 3 , KNbO 3 , LiVO 2 , Ramsdellite Li x TiO 2 , etc.…”

Section: Introductionmentioning

confidence: 99%

“…Our research group has been investigating a soft-chemical synthesis of metal oxides starting from a peroxo-metallic acid solution obtained by the direct reaction between metal powder and hydrogen peroxide. [19][20][21][22][23][24][25][26] Using such new methods we have successfully prepared K x WO 3 , 27 BaTiO 3 , 28 KNbO 3 , 29 LiVO 2 , 30 Ramsdellite Li x TiO 2 , 31 etc. In this study, we found that a direct reaction between tungsten (W) powder and 15%-30% hydrogen peroxide (H 2 O 2 ) aq gave a precipitate of h-WO 3 instead of a peroxo-polytungstic acid solution when metallic tungsten powder with smaller particle size, 0.45-0.59 lm, was used.…”

Section: Introductionmentioning

confidence: 99%

Facile synthesis of nanocrystalline hexagonal tungsten trioxide from metallic tungsten powder and hydrogen peroxide

Tsuyumoto

2017

J Am Ceram Soc

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A hexagonal form of tungsten trioxide (h‐WO3, particle size: 15.9‐57.1 nm) was found to be formed by a direct reaction between metallic tungsten powder (W, particle size: 0.45‐0.59 μm) and 15%‐30% hydrogen peroxide (H2O2) aq solution. Oxide film on the powder surface having the similar crystal structure as h‐WO3 was essential for the formation, and the surface oxide film was formed by aging the powder in air at 45°C, a relative humidity of 100% (PH2O 96 hPa) for 3‐28 days or in ambient atmosphere at room temperature for 12 years. The Rietveld analysis performed in the space group P63/mcm (Z = 6) indicated the crystal structures were the same as those of the reported h‐WO3 and that the crystallographic characteristic was as follows: a = 0.74219 nm, c = 0.77198 nm for h‐WO3 from the 28‐day aged powder, and a = 0.74538 nm, c = 0.77194 nm for h‐WO3 from the 12‐year aged powder.

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“…The initial goal of this project was to assess the capabilities of POMs as photoresist components for next-generation photolithography. Spin-coatable hybrid materials, especially their inorganic component traits, have consistently been sought after for properties such as etch resistance and reduced pattern swelling [5,6]. Also of interest for next-generation photolithography, metal-containing resists more strongly absorb light at extreme ultra-violet (EUV; 13 nm) wavelengths [7].…”

Section: Introductionmentioning

confidence: 99%

An Investigation of Polyoxometalate Hybrid Materials as Patternable Dielectrics and Lithographic Resists

Hardie

Roll

2017

Materials

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Polyoxometalate (POM) hybrid materials have shown potential as spin-coatable, patternable dielectric thin-films and components for lithographic resists. In particular, the octamolybdate cluster has been shown to possess good spin-coating properties and the patterning capabilities of hybrid octamolybdate thin-films were explored using a combination of broadband UV and electron beam lithography (EBL) techiniques. Dielectric properties of these films were determined by ellipsometry, and octamolybdate clusters were subsequently investigated as negative resists in various blends for potential uses in next-generation photolithography, where contrast, sensitivity, and line edge roughness characteristics were determined. Preliminary evidence for the suppression of the diffusion of photo-generated acids is presented.

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Spin‐Coatable Inorganic Resists Based on Novel Peroxopolyniobotungstic Acids for Bilayer Lithography

Cited by 31 publications

References 6 publications

Polyoxoanion Chemistry Moves toward the Future: From Solids and Solutions to Surfaces

Polyoxoanion Chemistry Moves toward the Future: From Solids and Solutions to Surfaces

Facile synthesis of nanocrystalline hexagonal tungsten trioxide from metallic tungsten powder and hydrogen peroxide

An Investigation of Polyoxometalate Hybrid Materials as Patternable Dielectrics and Lithographic Resists

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