2005
DOI: 10.1049/ip-opt:20055024
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Spectroscopic investigations of GaAsSb/GaAs based structures for 1.3 μm VCSEL applications

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Cited by 14 publications
(10 citation statements)
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“…19 In the comparison of the temperature dependence of the edge electroluminescence and the reflectivity (and thus the cavity mode), the alignment is found to occur at approximately 280(610) K. Further evidence for this comes from measuring the derivative of the reflectivity in temperature dependent electroreflectance measurements. 20 With this method, an alignment of the cavity mode and the QW electroluminescence have been found at 260(610) K. These data, therefore, suggest that the alignment occurs in the temperature range 260-280 K.…”
mentioning
confidence: 69%
“…19 In the comparison of the temperature dependence of the edge electroluminescence and the reflectivity (and thus the cavity mode), the alignment is found to occur at approximately 280(610) K. Further evidence for this comes from measuring the derivative of the reflectivity in temperature dependent electroreflectance measurements. 20 With this method, an alignment of the cavity mode and the QW electroluminescence have been found at 260(610) K. These data, therefore, suggest that the alignment occurs in the temperature range 260-280 K.…”
mentioning
confidence: 69%
“…The analysis of the photoluminescence ͑PL͒ peaks as a function of spacer thickness indicated a weak type-I band alignment, 12 whereas a second investigation studying the excitation intensity dependent shift of the PL peak positions at low temperature inferred the interface to be weakly type II. 13 There are several other publications supporting either type I ͑Refs. 14 and 15͒ or type II ͑Refs.…”
Section: Introductionmentioning
confidence: 99%
“…Furthermore, the fabrication of GaAs based 1.3 μm VCSELs can take full advantage of the industrial standard 850 nm VCSEL fabrication technology, which is attractive from a manufacturing point of view. Lasers (edge emitting [5] and VCSELs [6]) based upon this material have been an active research area due to their high potential for 1.3 μm active regions on a GaAs substrate [7]- [10]. However difficulty in growing high-quality GaAs 1-x Sb x /GaAs QW active material for 1.3Pm operation is one of the main challenges to make this material system commercially viable [11] [12].…”
Section: Introductionmentioning
confidence: 99%