2010
DOI: 10.1016/j.tsf.2009.09.042
|View full text |Cite
|
Sign up to set email alerts
|

Spectroscopic ellipsometry characterization of SiNx antireflection films on textured multicrystalline and monocrystalline silicon solar cells

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1
1

Citation Types

2
9
1

Year Published

2010
2010
2018
2018

Publication Types

Select...
5
3

Relationship

0
8

Authors

Journals

citations
Cited by 27 publications
(12 citation statements)
references
References 8 publications
2
9
1
Order By: Relevance
“…E g of TiAlON is almost the same, in the range of 3.6-3.7 eV when increasing the N 2 content from 15% to 30%, which is in the same order of that of TiAlO $3.4 eV (Nguyen et al, 2003). The band gap of Si 3 N 4 prepared at 20% (2.6031 eV) is in good agreement with literatures values 2.641 eV (Saenger et al, 2010), which is lower than the stochiometric Si 3 N 4 ($4.4 eV). Fig.…”
Section: Methodssupporting
confidence: 89%
“…E g of TiAlON is almost the same, in the range of 3.6-3.7 eV when increasing the N 2 content from 15% to 30%, which is in the same order of that of TiAlO $3.4 eV (Nguyen et al, 2003). The band gap of Si 3 N 4 prepared at 20% (2.6031 eV) is in good agreement with literatures values 2.641 eV (Saenger et al, 2010), which is lower than the stochiometric Si 3 N 4 ($4.4 eV). Fig.…”
Section: Methodssupporting
confidence: 89%
“…2, confirms that the optical properties of the a-Si:H layer are indeed unaffected by the underlying pyramid-shaped structure. In a previous SE characterization performed for SiN x /c-Si textured structures, on the other hand, the refractive index of the SiN x layer formed on the textured structure has been reported to decrease significantly, 7) although such effects have not been observed in our study. Figure 4 shows the total a-Si:H thickness on the textured c-Si substrate d tex , plotted as a function of the total a-Si:H thickness on the flat c-Si substrate d flat .…”
contrasting
confidence: 81%
“…Moreover, for SE characterization of thin layers deposited on c-Si textured structures, a tilt angle measurement configuration has recently been reported. 7) By adopting this method, silicon nitride (SiN x ) antireflection layers formed on c-Si textured structures have been characterized. 7) In this study, the tilt angle SE measurement has been applied to determine the structure and properties of very thin a-Si:H layers ($50 # A) deposited on pyramid-shaped single c-Si textures.…”
mentioning
confidence: 99%
“…The lateral measurement geometry with the tilted sample as described in Saenger et al was used to characterize a‐Si:H thin films deposited on c‐Si pyramids of type A. The inclination angle of the sample for measurement equals to the side angle β of the pyramid.…”
Section: Deeper Understanding Of Optical Properties In Pyramidal Textmentioning
confidence: 99%