Temperature-programmed reaction/desorption (TPR/D) and reflection−absorption infrared spectroscopy (RAIRS) have been employed to study the reactions of CH 2 CHBr and CH 3 CHBr 2 on Cu(100) and O/Cu(100). In the TPR/D study, CH 2 CHCHCH 2 is the sole product detected from the reaction of CH 2 CHBr adsorbed on Cu(100) and featured by complex, coverage-dependent thermal desorption profiles (∼220−380 K). The preadsorbed oxygen can modify the evolution behavior of 1,3-butadiene from the CH 2 CHBr reaction but has no influence on the main 1,3-butadiene formation at 265 K. Moreover, the surface oxygen participates in the CH 2 CHBr reaction, forming an intermediate of >CCO, as well as additional products of H 2 O, C 2 H 2 , CO, and CO 2 , presumably via H-abstraction. New reaction pathways, which are otherwise not observed in the TPR/D study, are opened when CH 2 CHBr impinges on Cu(100) at high temperatures. At 500 K, H 2 , C 2 H 2 , and C 2 H 4 are generated from the incident CH 2 CHBr molecules upon Cu(100). The reaction of adsorbed CH 3 CHBr 2 on Cu(100) only forms CH 3 CHCHCH 3 in TPR/D experiments. This product can be generated at the surface temperature as low as 120 K. Preadsorbed oxygen on Cu(100) can increase the 2-butene formation to 190 K, the peak temperature. An additional product of CH 3 CHO is also formed, but its amount is small. Apparently, preadsorbed oxygen on Cu(100) has different effects on the reaction pathways for the adsorbed CH 2 CHBr and CH 3 CHBr 2 .