2011
DOI: 10.1063/1.3599589
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Spectromicroscopy of tantalum oxide memristors

Abstract: Investigation of analog memristive switching of iron oxide nanoparticle assembly between Pt electrodes

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Cited by 87 publications
(58 citation statements)
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“…Important complementary information on the nature of the conduction channel was recently provided by hard X-ray spectromicroscopy [ 61 ] (Figure 3 f) performed on a Pt/TaO x /Pt device, which exhibited similar switching behavior as the Pt/TaO x / for details) in a low resistance state (ON state). On the resistance map, only one resistance dip of approximately 100 nm diameter (yellow-red dot) was observed, revealing that only one active switching region existed or was dominant in this device.…”
Section: Anatomy Of a Nanoscale Conduction Channel Reveals The Mechanmentioning
confidence: 97%
“…Important complementary information on the nature of the conduction channel was recently provided by hard X-ray spectromicroscopy [ 61 ] (Figure 3 f) performed on a Pt/TaO x /Pt device, which exhibited similar switching behavior as the Pt/TaO x / for details) in a low resistance state (ON state). On the resistance map, only one resistance dip of approximately 100 nm diameter (yellow-red dot) was observed, revealing that only one active switching region existed or was dominant in this device.…”
Section: Anatomy Of a Nanoscale Conduction Channel Reveals The Mechanmentioning
confidence: 97%
“…There is a consensus that for many oxide materials the low resistance state involves an oxygen deficient conductive filament that bridges the electrodes. 4,[16][17][18] In most cases, as grown devices are subjected to a forming step (in which a voltage stress is applied) to establish this filament. 11 Switching to the high resistance state then involves partial reoxidation of the filament.…”
mentioning
confidence: 99%
“…On the field of resistive switching up to now X-ray microscopy studies have only been reported for the investigation of polycrystalline devices which have been deposited on thin Si 3 N 4 membranes. 5,12 In this work we will employ bulk-sensitive NEXAFS-TXM to study the valence change in resistive switching devices based on single-crystalline SrTiO 3 thin films. Although industrial RRAM focus on amorphous or polycrystalline films grown on CMOS compatible Si, epitaxial films are very useful as a model system due to the absence of grain boundaries and a more defined defect a E-mail: a.koehl@fz-juelich.de structure.…”
Section: © 2013 Author(s) All Article Content Except Where Otherwismentioning
confidence: 99%