Spectroellipsometric characterization of plasma-deposited Au/SiO2 nanocomposite films

Dalacu, Dan; Martinů, L.

doi:10.1063/1.371849

Cited by 94 publications

(52 citation statements)

References 62 publications

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“…These regions correspond to intraband transitions below 2.3 eV (optical excitation of an electron below to above the Fermi energy within the same band), and interband transitions above 2.3 eV (direct transition of an electron to another band), which can be described by Drude freeelectron (intraband) and Lorentz oscillator models (interband) 31,32 . Experimentally, it was verified that the <ε 2 > spectrum changes drastically in the intraband region for Au particles dispersed in a polymer 33 or in a glass 34 matrix. The same behavior was observed for bulk Au films with thickness ranging from 10 to 25 nm and 50 to 500 nm, even after film annealing 30,35 .…”

Section: Glassmentioning

confidence: 80%

Fundamentals and applications of spectroscopic ellipsometry

Gonçalves¹,

Irene²

2002

Quím. Nova

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Recebido em 1/8/01; aceito em 8/11/01 This paper describes the use of ellipsometry as a precise and accurate technique for characterizing substrates and overlayers. A brief historical development of ellipsometry and the basic principles necessary to understand how an ellipsometer works are presented. There are many examples of studies performed in addressing materials science issues, and several are presented here: measurements of thickness, optical properties, and modeling of surface roughness. These selected results obtained in our laboratory for substrates, Si/SiO 2 interfaces, and polymers provide evidence that ellipsometry can play a critical role in characterizing different types of materials.Keywords: ellipsometry; polarization; films. BRIEF HISTORICAL OVERVIEWEllipsometry (reflection ellipsometry) measures the changes in the state of polarization of light upon reflection from a surface. The fact that changes are measured rather than the absolute intensity of light renders ellipsometry sensitive to submonolayer surface coverage. As a non-invasive and non-destructive tool, ellipsometry requires only a low-power light source and, consequently, it does not affect most processes, which renders ellipsometry a convenient tool for in situ studies 1,2 . P. Drude 3 was the first to build an ellipsometer even before Rothen has coined the word 'ellipsometry ' in 1945 4 . The equipment built by Drude is surprisingly very similar to many types of instruments in use today. Except for sparse papers, this technique received little attention for several decades after Drude, but in the 1970's and 1980's, ellipsometry became widely utilized, and relevant technical papers [5][6][7] and a classical book 8 were produced during this period. In 1991, Azzam compiled a considerable number of papers on ellipsometry 9 . As a search of the literature indicates, the number of papers on experimental improvement of ellipsometers has been decreasing in the last years, because many of the problems that existed before the advance of computers have been solved, including measurement speeds and spectral range. Most of the equipment used today is automated with wide band light sources, scanning monochromators, optical multichannel analyzers, and interfaces with acquisition and analysis software. Early studies on ellipsometry were performed using single wavelength equipment, usually a wide band visible light source with a filter, and later lasers. However, spectroscopic ellipsometers are commonly used nowadays in different research fields. BASIC CONCEPTSA description of ellipsometry as an optical technique would not be complete without mentioning J.C. Maxwell (1831-1879). Maxwell's theory predicts that light is a wave represented by two mutually perpendicular vectors: E, the amplitude of the electric field strength, and B, the amplitude of the magnetic field strength, and both E and B are also perpendicular to the direction of propagation, z. The electromagnetic wave is described by its amplitude and frequency in complex form:where E ...

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Section: Glassmentioning

confidence: 80%

Fundamentals and applications of spectroscopic ellipsometry

Gonçalves¹,

Irene²

2002

Quím. Nova

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“…Recent work suggested that the critical size for this transition is at ~8 nm, which is in good agreement with our data. 32 It should also be noted that the Au content in the current films is rather high (~35% in volume fraction) and interactions between neighboring particles are expected. The signature of these interactions on the optical spectra would result in both a red-shift and a broadening of the SPR band, 28 while our current work displays a redshift with a corresponding narrowing of the SPR band.…”

mentioning

confidence: 88%

Feasibility of a Stack Integrated Sofc Optical Chemical Sensor

Carpenter

2004

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The work performed during the UCR Innovative Concepts phase I program was designed to demonstrate the chemical sensing capabilities of nano-cermet SPR bands at solid oxide fuel cell operating conditions. Key to this proposal is that the materials choice used a YSZ ceramic matrix which upon successful demonstration of this concept, will allow integration directly onto the SOFC stack. Under the Innovative Concepts Program the University at Albany Institute for Materials (UAIM)/UAlbany School of NanoSciences and NanoEngineering synthesized, analyzed and tested Pa, and Au doped YSZ nano-cermets as a function of operating temperature and target gas exposure(hydrogen, carbon monoxide and 1-dodecanethiol). During the aforementioned testing procedure the optical characteristics of the nano-cermets were monitored to determine the sensor selectivity and sensitivity.

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“…The plasmonic properties of the nanocomposite films mainly depend upon the type of nanoparticles (Au or Ag), their morphology and the dielectric constant of the embedding matrix [5] [6] [7] [8] [9].…”

Section: Introductionmentioning

confidence: 99%

Effect of Substrate Temperature on Structural and Optical Properties of Au/SiO2 Nanocomposite Films Prepared by RF Magnetron Sputtering

Belahmar¹,

Chouiyakh²

2017

OALib

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Silica films containing gold nanoparticles were grown by magnetron radio frequency (rf) sputtering technique under various deposition conditions. The structural and optical properties of the composite films deposited at 400˚C substrate temperature were compared with those deposited at room temperature. Effect of substrate temperature of AuNPs on micro structural properties of the Au/SiO 2 nanocomposite films, such as size, dislocation density (δ), strain (ε) and lattice distortion (LD) have been investigated. The face-centered cubic crystalline structure of Au nanoparticles inclusion in the amorphous silica dielectric matrix was confirmed using X-ray diffraction. The average grain size of AuNPs has been found in the range of 0.56 -0.60 nm and 1.15 -1.23 nm at 3 × 10 −3 mbar and 2 × 10 −3 mbar argon pressure respectively. The δ, ε, LD values change inversely with the increasing of the substrate temperatures. These composites exhibit the optical features of a semiconductor with direct band gap. The band gap energy of 3.85 eV and 4.1 eV achieved for gold nanoparticles when the substrate temperatures increases from 25˚C to 400˚C. A peak wavelength of the surface plasmon resonance band absorption (SPR) characteristic of gold nanoparticle was found around 500 nm for the sample deposited at 2 × 10 −3 mbar and at 400˚C substrate temperature.

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Spectroellipsometric characterization of plasma-deposited Au/SiO2 nanocomposite films

Abstract: Surface relaxation during plasma-enhanced chemical vapor deposition of hydrocarbon films, investigated by in situ ellipsometry

Cited by 94 publications

References 62 publications

Fundamentals and applications of spectroscopic ellipsometry

Fundamentals and applications of spectroscopic ellipsometry

Feasibility of a Stack Integrated Sofc Optical Chemical Sensor

Effect of Substrate Temperature on Structural and Optical Properties of Au/SiO2 Nanocomposite Films Prepared by RF Magnetron Sputtering

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