Spectral Sensitivity and Linearity of Shipley AZ-1350J Photoresist

Norman, Scott L.; Singh, Mandeep

doi:10.1364/ao.14.000818

Cited by 30 publications

(11 citation statements)

References 4 publications

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“…:0.20 (1) where A and A(ne) are the 6328-A He-Ne laser wavelength and the peak-to-peak difference in film optical thickness for a sinusoidal phase modulation, respectively.…”

Section: Measurement Setupmentioning

confidence: 99%

Analysis of a phase-modulating recording mechanism in negative photoresist

Frejlich

Cescato

1981

J. Opt. Soc. Am.

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“…:0.20 (1) where A and A(ne) are the 6328-A He-Ne laser wavelength and the peak-to-peak difference in film optical thickness for a sinusoidal phase modulation, respectively.…”

Section: Measurement Setupmentioning

confidence: 99%

Analysis of a phase-modulating recording mechanism in negative photoresist

Frejlich

Cescato

1981

J. Opt. Soc. Am.

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“…Inspired by this exotic ability of holography to record and read out the phase information of the scattered light, much of the relevant developments have focused on improving the efficiency of recording and reconstruction of 3D optical images. This has led to the development of both holographic materials (e.g., intensity/polarization holographic materials such as diffractive [ 4–19 ] and holographic optical elements [ 20–60 ] (DOEs and HOEs)) and recording and reconstruction strategies (e.g., Gabor‐, [ 2,3 ] Denisyuk‐, [ 61 ] and Leith/Upatnieks [ 62,63 ] ‐type holograms). These research efforts had progressed and matured well from the 1960s to the 1990s, and many applications of Fourier optics such as augmented reality/virtual reality (AR/VR), [ 64–86 ] 3D optical data storage, [ 49,87–97 ] and Bragg diffractive visual sensors, [ 98–102 ] benefitted significantly from such impressive developments in holographic technologies.…”

Section: Introductionmentioning

confidence: 99%

“…[ 177 ] This was followed by the combinatorial mixing of multiples beams (3D interference patterns) that were found to be able to show 3D PhCs with all 14 Bravais “nanoscale” lattices according to a level‐set approach. [ 173 ] Although holographic fabrication has been occasionally used for 1D or 2D micro/nanofabrication during the 1970s–1990s, [ 4–19,178–196 ] its extension to 3D PhCs was not reached before the work by Turberfield et al [ 177 ]…”

Section: Introductionmentioning

confidence: 99%

“…3D PhCs (also called volume gratings) can be categorized as HOEs. [ 4–51,178–180,207–219 ] However, it has recently been shown that holographic fabrications are readily compatible with the materialization of Weyl points, [ 166,174,197–202,220–226 ] bound states in the continuum (BIC), [ 203–206,227,228 ] and exceptional point (EP) [ 229–232 ] optical materials, which can be rationalized by full electromagnetic theory beyond analytical Fourier optics. Nevertheless, the conventional research paradigms of holographic fabrications defined by the previously reported highly reputed reviews, [ 107,108,140,149,159,216,233–237 ] are still limited to Fourier PhCs.…”

Section: Introductionmentioning

confidence: 99%

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Holography, Fourier Optics, and Beyond Photonic Crystals: Holographic Fabrications for Weyl Points, Bound States in the Continuum, and Exceptional Points

Lim

Park

Kang

et al. 2021

Advanced Photonics Research

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Since the 1990s, applications of holography and Fourier optics have been significantly expanded from the spatial modulation of light propagation to the nanofabrication of superlattices. Holographic mixing of multiple beams is found to be highly compatible with unprecedented engineering of 1D, 2D, and 3D superlattices, particularly at the nanoscales. This is essential for the development of champion photonic crystals working at optical frequencies. However, these extensive efforts toward holographic photonic crystals have declined with the failure to obtain a champion photonic crystal and the rapid rise of other important classes of optical modes in the 2010s such as Weyl points, bound state in continuum (BIC), and exceptional points (EPs). To obtain photonic crystals, the symmetric modulations of the sinusoidally distributed real part of permittivity (Re(ε)), that can be considered as waves of matter from the viewpoint of Fourier optics, are sufficient. However, Weyl points, BIC, and EPs demand more complicated and advanced modulation of such as asymmetrically distributed wave of Re(ε) and the coupled Re(ε) and imaginary ε (Im(ε)). It is, therefore, important to determine whether holographic fabrications can be an efficient solution to Weyl points, BIC, and EPs. In this review, a comprehensive overview of holography, Fourier optical surface/volume gratings, and their implementations for Weyl points, BIC, and EPs is presented.

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“…The samples were cleaned according to the method presented in Ref. 8, and for some experiments the back surface was painted black with 3M Nextel 101-ClO velvet coating. The AZ-1350B photoresist was then deposited in a single layer, and after 30 sec it was spun at 3600 rpm for 30 sec.…”

mentioning

confidence: 99%

Linearity and enhanced sensitivity of the Shipley AZ-1350B photoresist

et al. 1977

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The properties of the Shipley AZ-1350B positive photoresist used with the Shipley AZ-303A developer were investigated. It was found that the use of AZ-303A developer results in a significant improvement of the sensitivity and the linearity of the photoresist. The unexposed etch rate of the photoresist was 35 A + 5 A/ gec. Gratings of high efficiency have been successfully fabricated using the above combination of photoresist and developer.Current work in integrated optics requires the fabrication of relief grating structures on photoresist and the subsequent chemical or ion beam etching through the photoresist. 1 If the period of the grating is to be less than 0.4gm the Shipley AZ-1350B photoresist is commonly used. The properties of this positive acting photoresist have been examined in detail, 2 3 and it was found that the photoresist exhibits strong nonlinearity, where T is the development time in seconds, c is the exposure constant characteristic of the photoresist, r, is the rate of etching of exposed molecules, r 2 is the rate Ad ArTcE + r 2 T.In this work we determined the parameters involved in Eq. (2) for the Shipley AZ-1350B photoresist used with the AZ-303A developer.The samples used were NO. 3010 microscope slides made by Clay Adams, which, cut in half, resulted in a size of 38 mm X 25 mm X 1 mm. The samples were cleaned according to the method presented in Ref. 8, and for some experiments the back surface was painted black with 3M Nextel 101-ClO velvet coating. The AZ-1350B photoresist was then deposited in a single layer, and after 30 sec it was spun at 3600 rpm for 30 sec.The samples were baked, next, for 30 min at 1000C. The first experiment involved the determination of the etch rate of the unexposed resist as a function of development time for various solutions of AZ-303A developer with distilled water. For this purpose the samples were half immersed in the developer for the required time, rinsed with deionized water for 2 min, and then baked under vacuum at 1000C for 30 min. The step size was measured using a Sloan Dektat instrument, and the results are shown in Fig. 1. The 4:1 solution (four parts distilled water, 1 part AZ-303A developer) gave unacceptably high etch rates, and the 8:1 gave low and nonlinear ones. We chose the 6:1 dilution for all our experiments, since it exhibited a linear behavior and an acceptable etch rate of r 2 = 35 A 5 A/sec. The development time chosen for the subsequent experiment was 10 sec.For comparison, we performed the same experiment using the Shipley MF-312 developer. This developer is free from trace-metallic elements and is commonly used in the fabrication of photoresist gratings in semiconductor substrates. Figure 2 shows the unexposed etch rate as a function of development time in minutes for the manufacturer's recommended dilution of 1:1. In

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Spectral Sensitivity and Linearity of Shipley AZ-1350J Photoresist

Cited by 30 publications

References 4 publications

Analysis of a phase-modulating recording mechanism in negative photoresist

Analysis of a phase-modulating recording mechanism in negative photoresist

Holography, Fourier Optics, and Beyond Photonic Crystals: Holographic Fabrications for Weyl Points, Bound States in the Continuum, and Exceptional Points

Linearity and enhanced sensitivity of the Shipley AZ-1350B photoresist

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