Abstract:With the development of high-volume manufacturing for very-large-scale integrated circuits, the purity of the light source in the extreme ultraviolet lithography (EUVL) system needs to fulfil extreme requirements in order to avoid thermal effect, optical distortion and critical dimension errors caused by out-of-band radiations. This paper reviews the key technologies and developments of the spectral purity systems for both a free-standing system and a built-in system integrated with the collector. The main cha… Show more
Objective Over the past decade, integrated circuit (IC) technology has experienced remarkable advancements through the use of complex threedimensional (3D) device structures, including new materials, patterning techniques, and processes
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