Spectral control of emissions from tin doped targets for extreme ultraviolet lithography

Harilal, S. S.; O'Shay, B; Tillack, M. S.; Tao, Y.; Paguio, R. R.; Nikroo, A.; Back, C. A.

doi:10.1088/0022-3727/39/3/010

Cited by 59 publications

(43 citation statements)

References 22 publications

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“…The selection of this laser irradiance is based on the fact that our EUV spectroscopic studies showed the unresolved transition array ͑UTA͒ around 13.5 nm from tin plasma to peak at this intensity level using a 60 m spot size. 38 The figure indicates that the SMB fit is in relatively good agreement with the experimental observed TOF curve.…”

Section: A Time Of Flight Studiessupporting

confidence: 66%

Ambient gas effects on the dynamics of laser-produced tin plume expansion

Harilal¹,

O'Shay²,

Tao³

et al. 2006

Journal of Applied Physics

119

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Controlling the debris from a laser-generated tin plume is one of the prime issues in the development of an extreme ultraviolet lithographic light source. An ambient gas that is transparent to 13.5 nm radiation can be used for controlling highly energetic particles from the tin plume. We employed a partial ambient argon pressure for decelerating various species in the tin plume. The kinetic energy distributions of tin species were analyzed at short and large distances using time and space resolved optical emission spectroscopy and a Faraday cup, respectively. A fast-gated intensified charged coupled device was used for understanding the hydrodynamics of the plume's expansion into argon ambient. Our results indicate that the tin ions can be effectively mitigated with a partial argon pressure ϳ65 mTorr. Apart from thermalization and deceleration of plume species, the addition of ambient gas leads to other events such as double peak formation in the temporal distributions and ambient plasma formation.

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Section: A Time Of Flight Studiessupporting

confidence: 66%

Ambient gas effects on the dynamics of laser-produced tin plume expansion

Harilal¹,

O'Shay²,

Tao³

et al. 2006

Journal of Applied Physics

119

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“…For example, the UTA emission around 13.5 nm is mainly contributed by Sn 8+ to Sn 13+ ions. 17 In a laser-produced plasma, the velocity of the ions is dependent on their charge state and highly charged ions move with faster expansion velocity. This can be understood by considering the plume expansion in the initial stages where electrons strive to overtake the ions resulting in a space charge field that accelerates ions causing higher velocity for highly charged ionic states.…”

Section: Resultsmentioning

confidence: 99%

Influence of spot size on propagation dynamics of laser-produced tin plasma

Harilal¹

2007

Journal of Applied Physics

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The plume dynamics in the presence of an ambient gas is very intriguing physics. The expansion of a laser-produced plasma in the presence of an ambient gas leads to internal plume structures, plume splitting, sharpening, confinement, etc. We investigated propagation dynamics of an expanding tin plume for various spot sizes using a fast visible plume imaging and Faraday cup diagnostic tools. Our results indicate that the sharpening of the plume depends strongly on the spot size. With a smaller spot size, the lateral expansion is found to be higher and the plume expansion is spherical while with a larger spot size the plume expansion is more cylindrical. Analysis of time resolved imaging also showed internal structures inside the plume.

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“…Low density Sn-doped plastic foam, 4,5 Sn-doped water droplet targets, 6 and fine Sn particles driven by gas puff have been investigated as masslimited targets to mitigate Sn particles. However, extra C, O, and H ions with very high velocity are inherently generated from these targets.…”

mentioning

confidence: 99%

Mitigation of fast ions from laser-produced Sn plasma for an extreme ultraviolet lithography source

Tao

Tillack

2006

Applied Physics Letters

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The authors present evidence of the reduction of fast ion energy from laser-produced Sn plasma by introducing a low energy prepulse. The energy of Sn ions was reduced from more than 5keV to less than 150eV nearly without loss of the in-band conversion from laser to 13.5nm extreme ultraviolet (EUV) emission as compared with that of a single pulse. The reason may come from the interaction of the main pulse with preplasma instead of the full density solid surface. This makes it possible to use the full density Sn target in the practical EUV lithography source.

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Spectral control of emissions from tin doped targets for extreme ultraviolet lithography

Cited by 59 publications

References 22 publications

Ambient gas effects on the dynamics of laser-produced tin plume expansion

Ambient gas effects on the dynamics of laser-produced tin plume expansion

Influence of spot size on propagation dynamics of laser-produced tin plasma

Mitigation of fast ions from laser-produced Sn plasma for an extreme ultraviolet lithography source

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