2022
DOI: 10.1016/j.optlaseng.2022.107168
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Spatial self-phase modulation with tunable dynamic process and its applications in all-optical nonlinear photonic devices

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Cited by 9 publications
(7 citation statements)
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“…From the measured T total = 38% at 532 nm, we estimate N eff ∼ 322, by taking the typical value of T monolayer ∼ 99.7%. [31][32][33] Accordingly, the thirdorder nonlinear susceptibility of monolayer VP Ns is obtained to be χ ð3Þ monolayer = (3.4 ± 0.3) × 10 −9 esu at 532 nm, which is comparable with those of BP Ns, 9,34 NbSe 2 Ns, 35 and boron Ns. 20 Note that χ ð3Þ monolayer is correlated to the carrier mobility μ by the empirical formula χ ð3Þ monolayer = 0.146 × √μ.…”
Section: Nonlinear Optical Propertiesmentioning
confidence: 94%
“…From the measured T total = 38% at 532 nm, we estimate N eff ∼ 322, by taking the typical value of T monolayer ∼ 99.7%. [31][32][33] Accordingly, the thirdorder nonlinear susceptibility of monolayer VP Ns is obtained to be χ ð3Þ monolayer = (3.4 ± 0.3) × 10 −9 esu at 532 nm, which is comparable with those of BP Ns, 9,34 NbSe 2 Ns, 35 and boron Ns. 20 Note that χ ð3Þ monolayer is correlated to the carrier mobility μ by the empirical formula χ ð3Þ monolayer = 0.146 × √μ.…”
Section: Nonlinear Optical Propertiesmentioning
confidence: 94%
“…42 And the undoped and Zn-doped MAPbBr 3 /PMMA have potential applications in phase modulators. 47 The γ is another important parameter for NLO materials, which is obtained by theoretically fitting the NLR curves using the following formulas: 48 n = n 0 + γI where n 0 and n represent the linear refractive index and total refractive index. Δ Φ 0 = kL eff γI 0 , which is the on-axis NLR phase shift at z = 0. k = 2π/ λ .…”
Section: Resultsmentioning
confidence: 99%
“…It is widely accepted that the nonlinear refractive index n 2 can be calculated straight from the SSPM patterns [3]. Using previously reported equations, the nonlinear refractive index n 2 and the thermos-optic coefficient dn/dT can be conveniently estimated [12,21,30]. The rings in the SSPM pattern show a linear dependence on the laser intensity.…”
Section: Resultsmentioning
confidence: 99%
“…The formation of such patterns under laser excitation while traversing a nonlinear absorbing medium has been studied in several systems including dye solutions, polymers, 2D materials, liquid crystals, etc. It has garnered significant attention in the discipline of photonics considering its potential uses in all-optical modulation and switching [11,12].…”
Section: Introductionmentioning
confidence: 99%